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Track

Category: Resell Products Tags: Coater Developer Clean, Wet Process

Description

Description

The following Track equipment are only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time!

Condition: Used

1	Axcelis RapidCure 320FC RPC
2	Axcelis RapidCure 320FC UV anneal Unit
3	FSI Scorpio Wet Process Equipment
4	Fusion M150PCU Lithography
5	SCREEN DT-3000 SOH Coater, Resist/Poly Spin coater
6	SCREEN DT-3000 SOHCoat_LIT
7	SCREEN DT-3000 Sokudo Track
8	SCREEN RF-300A COT/DEV
9	SCREEN RF-300A i-Line Track
10	SCREEN RF-300A Photoresist
11	SCREEN SK-W80B-B Photo Track
12	SCREEN SS-3000-A SCRUBBER
13	SCREEN SS-3000-AR SCRUBBER
14	SCREEN SS-3100 Wafer Scrubber
15	SCREEN SS-3100 WET SCRUBBER/BRUSH CLEANER
16	SCREEN SS-W80A-A SCRUBBER
17	Semix TZP Lithography
18	SUSSMicroTec ACS200 Gen3 Litho
19	SUSSMicroTec ACS300 Gen2 RDL Coater Developer
20	SUSSMicroTec Gamma Coater & Developer
21	TEL ACT12 Dual Track
22	TEL ACT8 Dual COT/DEV
23	TEL ACT8 Single COT/DEV
24	TEL LITHIUS Arf
25	TEL LITHIUS COT/DEV
26	TEL LITHIUS Lithography DUV
27	TEL LITHIUS Photoresist Coat Track
28	TEL LITHIUS Photoresist Coater
29	TEL LITHIUS Pro COT/DEV
30	TEL LITHIUS Pro V 193nm Immersion
31	TEL LITHIUS Resist Coat/Develop
32	TEL NS300 SCRUBBER

ID-SS5684W

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Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch,Enviro,ENVIRO-1XaENVIRO-1Xa ,2CENVIRO-Optima,Luminous NA,NA-8000NA-1300NA-1500 ,Multifilm,NE-550EXaNE-950EX, APIOSNE-5700Deep, Oxide Etching,NLD-570EXaRISE System,RISE Series,Cluster Systems,SME SeriesuGmni Series,SRH SeriesULDiS Series,SMV-500FRoll-coater,SPW SeriesIn-line Systems,SIV SeriesSDH-4550LR&D,CS-200, 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formation,radical-based oxidation process,rapid thermal processing spike anneal,300mm RTP spike anneal process,ramp-up methodologies, rampdown methodologies,Rapid thermal annealing apparatus,RTA furnace,Dai-ichi Kiden,Dai-ichi Kiden RSA, Combustion furnace, High vacuum heating system, Vertical high temperature heating system,Induction heating system(elevating),Ultra high temperature heating system,CreaTec Fischer,Growth Systems,Mini MBE System,LT-STM/AFM,Evaporators,Centrotherm,centrotherm c.HORICOO 300 ,horizontal batch-type system,centrotherm c.HORICOO 200 , field-proven , ultra-versatile tube furnace system ,centrotherm c.VERTICOO , batch-type wafer processing , semiconductor device fabrication, atmospheric processes, LPCVD processes,centrotherm c.ACTIVATOR, high-temperature annealing, high-volume SiC device manufacturing, electrical activation , post implantation annealing ,SiC MOSFET , diode manufacturing,Cost-efficient dopant activation,Annealing of AlN seed layers , Annealing of AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，