Description
The following Semiconductor Equipment are only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time!
| 1 | Bake/Cure Equipment Cure Oven Despatch Industries LND 2-11 |
| 2 | Bake/Cure Equipment Cure Oven Despatch Industries LND 2-11 |
| 3 | Bake/Cure Equipment Cure Oven Despatch Industries LND 2-11 |
| 4 | Bake/Cure Equipment Cure Oven Despatch Industries LND |
| 5 | Ball Mount Solder Ball Mount Zen Voce Corporation BM388 |
| 6 | Bonder Die Bonder BESI Datacon 8800 TC |
| 7 | Bonder Die Bonder BESI Datacon 8800 TC |
| 8 | Circuit Analysis and Editing Electrical Failure Analysis Hamamatsu iPHEMOS-TP |
| 9 | CMP Equipment Dielectric CMP Applied Materials Reflexion – Dielectric |
| 10 | CMP Equipment Dielectric CMP Applied Materials Reflexion – Dielectric |
| 11 | CMP Equipment Dielectric CMP Applied Materials Reflexion – Dielectric |
| 12 | CMP Equipment Dielectric CMP Applied Materials Reflexion – Dielectric |
| 13 | CMP Equipment Dielectric CMP Applied Materials Reflexion – Dielectric |
| 14 | CMP Equipment Dielectric CMP Applied Materials Reflexion LK Prime Oxide |
| 15 | CMP Equipment Dielectric CMP Ebara FREX300S |
| 16 | CMP Equipment Dielectric CMP SpeedFam Corp. Auriga C |
| 17 | CMP Equipment Dielectric CMP SpeedFam Corp. Auriga C |
| 18 | CMP Equipment Multi-Process CMP Applied Materials Reflexion |
| 19 | CMP Equipment Multi-Process CMP Applied Materials Reflexion |
| 20 | CMP Equipment Multi-Process CMP Applied Materials Reflexion |
| 21 | CMP Equipment Multi-Process CMP Applied Materials Reflexion LK |
| 22 | CMP Equipment Multi-Process CMP Applied Materials Reflexion LK |
| 23 | CNC Equipment Wire EDM (Electrical Discharge Machine) Mitsubishi DWC-90 |
| 24 | Deposition Equipment ALD (Atomic Layer Deposition) ASM International Eagle XP EmerALD |
| 25 | Deposition Equipment Decoupled Plasma Nitride Applied Materials Centura ACP DPN HD Gate Stack |
| 26 | Deposition Equipment Decoupled Plasma Nitride Applied Materials Centura ACP DPN HD Gate Stack |
| 27 | Deposition Equipment Decoupled Plasma Nitride Applied Materials Centura ACP DPN HD Gate Stack |
| 28 | Deposition Equipment Decoupled Plasma Nitride Applied Materials Centura ACP DPN HD Gate Stack |
| 29 | Deposition Equipment Decoupled Plasma Nitride Applied Materials Centura ACP DPN HD Gate Stack |
| 30 | Deposition Equipment Decoupled Plasma Nitride Applied Materials Centura ACP DPN HD Gate Stack |
| 31 | Deposition Equipment Decoupled Plasma Nitride Applied Materials Centura ACP DPN HD Gate Stack |
| 32 | Deposition Equipment Decoupled Plasma Nitride Applied Materials Centura ACP DPN Plus Gate Stack |
| 33 | Deposition Equipment Epitaxial Silicon (EPI) Applied Materials Centura ACP RP EPI |
| 34 | Deposition Equipment Epitaxial Silicon (EPI) ASM International Epsilon E3200 |
| 35 | Deposition Equipment Epitaxial Silicon (EPI) ASM International Epsilon E3200 |
| 36 | Deposition Equipment Evaporator Deposition Equipment Felicity Technology (FSE) FSE-CS-300 |
| 37 | Deposition Equipment HDP CVD (Chemical Vapor Deposition) Applied Materials Centura AP Ultima X |
| 38 | Deposition Equipment HDP CVD (Chemical Vapor Deposition) Applied Materials Centura AP Ultima X |
| 39 | Deposition Equipment HDP CVD (Chemical Vapor Deposition) Applied Materials Centura AP Ultima X |
| 40 | Deposition Equipment HDP CVD (Chemical Vapor Deposition) Applied Materials Centura AP Ultima X |
| 41 | Deposition Equipment HDP CVD (Chemical Vapor Deposition) Applied Materials Centura AP Ultima X |
| 42 | Deposition Equipment HDP CVD (Chemical Vapor Deposition) Applied Materials Centura AP Ultima X |
| 43 | Deposition Equipment HDP CVD (Chemical Vapor Deposition) Applied Materials Centura AP Ultima X |
| 44 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Applied Materials Centura AP iSprint |
| 45 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Trias Ti/TiN |
| 46 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Trias Ti/TiN |
| 47 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Trias Ti/TiN |
| 48 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Trias Ti/TiN |
| 49 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Trias Ti/TiN |
| 50 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Trias W – Chamber Only |
| 51 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Triase+ SPA |
| 52 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Triase+ SPA |
| 53 | Deposition Equipment Metal CVD (Chemical Vapor Deposition) Tokyo Electron Ltd. Triase+ Ti/TiN |
| 54 | Deposition Equipment MOCVD Tokyo Electron Ltd. Trias W |
| 55 | Deposition Equipment MOCVD Tokyo Electron Ltd. Trias W |
| 56 | Deposition Equipment Parts/Peripherals Tokyo Electron Ltd. Trias Chamber |
| 57 | Deposition Equipment Parts/Peripherals Tokyo Electron Ltd. Trias Chamber |
| 58 | Deposition Equipment Parts/Peripherals Tokyo Electron Ltd. Trias Chamber |
| 59 | Deposition Equipment Parts/Peripherals Tokyo Electron Ltd. Trias Chamber |
| 60 | Deposition Equipment Parts/Peripherals Tokyo Electron Ltd. Trias Ti/TiN Chamber |
| 61 | Deposition Equipment Parts/Peripherals Tokyo Electron Ltd. Trias Ti/TiN Chamber |
| 62 | Deposition Equipment Parts/Peripherals Tokyo Electron Ltd. Trias Ti/TiN Chamber |
| 63 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Celera |
| 64 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Celera |
| 65 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Celera |
| 66 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Eterna FCVD |
| 67 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Eterna FCVD |
| 68 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Eterna FCVD |
| 69 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Eterna FCVD |
| 70 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Eterna FCVD |
| 71 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Eterna FCVD |
| 72 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT Eterna FCVD |
| 73 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT SiCoNi Clean |
| 74 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer GT3 APFe |
| 75 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer SE BD/BLOk Low k Dielectric |
| 76 | Deposition Equipment PECVD (Chemical Vapor Deposition) Applied Materials Producer SE BD/BLOk Low k Dielectric |
| 77 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle XP |
| 78 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle XP |
| 79 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle XP |
| 80 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle XP |
| 81 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle XP |
| 82 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle XP |
| 83 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 84 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 85 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 86 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 87 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 88 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 89 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 90 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 91 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 92 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 93 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 94 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 95 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 96 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 97 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 98 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 99 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 100 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 101 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 102 | Deposition Equipment PECVD (Chemical Vapor Deposition) ASM International Eagle-12 Rapidfire |
| 103 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II |
| 104 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Chamber: PC XT |
| 105 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Chamber: PC XT |
| 106 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Chamber: PC XT |
| 107 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Chamber: PVD |
| 108 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Front-End Metallization |
| 109 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Front-End Metallization |
| 110 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Liner/Barrier |
| 111 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Liner/Barrier |
| 112 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Liner/Barrier |
| 113 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Liner/Barrier |
| 114 | Deposition Equipment PVD (Physical Vapor Deposition) Applied Materials Endura II Liner/Barrier |
| 115 | Deposition Equipment PVD (Physical Vapor Deposition) Ulvac Corporation Entron-EX |
| 116 | Deposition Equipment PVD (Physical Vapor Deposition) Ulvac Corporation Entron-EX |
| 117 | Deposition Equipment PVD (Physical Vapor Deposition) Ulvac Corporation Entron-EX |
| 118 | Deposition Equipment PVD (Physical Vapor Deposition) Ulvac Corporation Entron-EX |
| 119 | Deposition Equipment SACVD (Chemical Vapor Deposition) Applied Materials Producer SE SACVD |
| 120 | Deposition Equipment WCVD (Chemical Vapor Deposition) Novellus Systems Inc. Concept Three Altus Max EFX |
| 121 | Device Handler Pick & Place SOC Handler Delta Design Pyramid |
| 122 | Device Handler Pick & Place SOC Handler Delta Design Pyramid |
| 123 | Device Handler Pick & Place SOC Handler Delta Design Pyramid |
| 124 | Device Handler Pick & Place SOC Handler Delta Design Pyramid |
| 125 | Electronics Cooling CPU Cooling Fan Cooljag Thermal Solutions SP3-D/SQ |
| 126 | Etch/Ash/Clean – Plasma Processing Dielectric Etch AMEC Primo SSC AD-RIE |
| 127 | Etch/Ash/Clean – Plasma Processing Dielectric Etch AMEC Primo SSC AD-RIE |
| 128 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Applied Materials Centura AP eMax CT |
| 129 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Applied Materials Centura AP Enabler |
| 130 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Applied Materials Centura AP Enabler |
| 131 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Applied Materials Centura AP Enabler |
| 132 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Applied Materials Producer Etch eXT Dielectric |
| 133 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan |
| 134 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan |
| 135 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan |
| 136 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex – Chamber Only |
| 137 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex – Chamber Only |
| 138 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex – Chamber Only |
| 139 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex 45 |
| 140 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex 45 |
| 141 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX |
| 142 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX |
| 143 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX |
| 144 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX |
| 145 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX |
| 146 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX+ |
| 147 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX+ |
| 148 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX+ |
| 149 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX+ |
| 150 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 Exelan Flex EX+ |
| 151 | Etch/Ash/Clean – Plasma Processing Dielectric Etch LAM Research 2300 SELIS – Chamber Only |
| 152 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Tokyo Electron Ltd. Tactras Vigus |
| 153 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Tokyo Electron Ltd. Tactras Vigus |
| 154 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Tokyo Electron Ltd. Tactras Vigus RK3 – Chamber Only |
| 155 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Tokyo Electron Ltd. Telius 305 DRM |
| 156 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Tokyo Electron Ltd. Telius 305 DRM |
| 157 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Tokyo Electron Ltd. Telius 305 SCCM |
| 158 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Tokyo Electron Ltd. Telius 305 SCCM |
| 159 | Etch/Ash/Clean – Plasma Processing Dielectric Etch Tokyo Electron Ltd. Telius SP-305 SCCM |
| 160 | Etch/Ash/Clean – Plasma Processing Metal Etch Applied Materials Centura AP DPS AdvantEdge G2 Metal – Chamber Only |
| 161 | Etch/Ash/Clean – Plasma Processing Metal Etch Applied Materials Centura AP DPS AdvantEdge G2 Metal – Chamber Only |
| 162 | Etch/Ash/Clean – Plasma Processing Metal Etch Hitachi (Semiconductor) U-702 |
| 163 | Etch/Ash/Clean – Plasma Processing Metal Etch Hitachi (Semiconductor) U-7050A |
| 164 | Etch/Ash/Clean – Plasma Processing Metal Etch LAM Research 2300 KIYO MCX |
| 165 | Etch/Ash/Clean – Plasma Processing Metal Etch LAM Research 2300 KIYO MCX |
| 166 | Etch/Ash/Clean – Plasma Processing Metal Etch LAM Research TCP 9600CFE |
| 167 | Etch/Ash/Clean – Plasma Processing Metal Etch Shibaura Engineering Works Ltd. CDE-300 |
| 168 | Etch/Ash/Clean – Plasma Processing Multi-Process Etch Plasma-Therm I.P. Inc. 790 Etch |
| 169 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch Applied Materials Centura AP – Mainframe Only (Poly Etch) |
| 170 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch Applied Materials Centura AP AdvantEdge G5 Mesa T2 Poly |
| 171 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch Applied Materials Centura AP AdvantEdge G5 Mesa T2 Poly |
| 172 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch Applied Materials Centura AP AdvantEdge G5 Minos Poly |
| 173 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch Applied Materials Centura AP DPS AdvantEdge G2 Poly |
| 174 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch Applied Materials Centura AP DPS AdvantEdge Poly |
| 175 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch LAM Research 2300 KIYO EX Poly – Chamber Only |
| 176 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch LAM Research 2300e5 KIYO 45 |
| 177 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch LAM Research 2300e5 KIYO 45 |
| 178 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch LAM Research 2300e5 KIYO 45 |
| 179 | Etch/Ash/Clean – Plasma Processing Polysilicon Etch Tokyo Electron Ltd. Tactras RLSA Poly |
| 180 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Axcelis Technologies Inc. RapidStrip 320 |
| 181 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Axcelis Technologies Inc. RapidStrip 320 |
| 182 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Axcelis Technologies Inc. RapidStrip 320 |
| 183 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Axcelis Technologies Inc. RapidStrip 320 |
| 184 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Axcelis Technologies Inc. RapidStrip 320 |
| 185 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Axcelis Technologies Inc. RapidStrip 320 |
| 186 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Axcelis Technologies Inc. RapidStrip 320 |
| 187 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Canon Surpass 320 |
| 188 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Canon Surpass 320 |
| 189 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Canon Surpass 320 |
| 190 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Canon Surpass 320 |
| 191 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Canon Surpass 320 |
| 192 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Canon Surpass 320 |
| 193 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Mattson Technology, Inc. Aspen III ICP |
| 194 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Mattson Technology, Inc. Aspen III ICP |
| 195 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Mattson Technology, Inc. Aspen III ICPHT |
| 196 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Novellus Systems Inc. GAMMA Express |
| 197 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Novellus Systems Inc. GAMMA Express |
| 198 | Etch/Ash/Clean – Plasma Processing Stripper/Asher P.S.K. Tech Inc. Supra IV |
| 199 | Etch/Ash/Clean – Plasma Processing Stripper/Asher P.S.K. Tech Inc. Tigma N |
| 200 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Plasma System Corp. DES-220 |
| 201 | Etch/Ash/Clean – Plasma Processing Stripper/Asher Plasma System Corp. SA-2000 |
| 202 | Etch/Clean – Wet Processing Batch Wafer Processing Dainippon Screen Mfg. Co. FC-3000 |
| 203 | Etch/Clean – Wet Processing Batch Wafer Processing Dainippon Screen Mfg. Co. FC-3000 |
| 204 | Etch/Clean – Wet Processing Batch Wafer Processing Dainippon Screen Mfg. Co. FC-3100 |
| 205 | Etch/Clean – Wet Processing Batch Wafer Processing Kaijo Corporation SFT-300 |
| 206 | Etch/Clean – Wet Processing Batch Wafer Processing Kaijo Corporation SFT-305 |
| 207 | Etch/Clean – Wet Processing Batch Wafer Processing Kaijo Corporation SFT-305e |
| 208 | Etch/Clean – Wet Processing Batch Wafer Processing S.E.S. CO., LTD. BW3000X |
| 209 | Etch/Clean – Wet Processing Batch Wafer Processing S.E.S. CO., LTD. BW3000X |
| 210 | Etch/Clean – Wet Processing Batch Wafer Processing Tokyo Electron Ltd. Expedius |
| 211 | Etch/Clean – Wet Processing Batch Wafer Processing Tokyo Electron Ltd. Expedius |
| 212 | Etch/Clean – Wet Processing Batch Wafer Processing Tokyo Electron Ltd. Expedius+ |
| 213 | Etch/Clean – Wet Processing Batch Wafer Processing Tokyo Electron Ltd. UW200Z |
| 214 | Etch/Clean – Wet Processing Batch Wafer Processing Tokyo Electron Ltd. UW300Z |
| 215 | Etch/Clean – Wet Processing Single Wafer Processing Dainippon Screen Mfg. Co. SU-3000 |
| 216 | Etch/Clean – Wet Processing Single Wafer Processing Dainippon Screen Mfg. Co. SU-3000 |
| 217 | Etch/Clean – Wet Processing Single Wafer Processing Dainippon Screen Mfg. Co. SU-3000 |
| 218 | Etch/Clean – Wet Processing Single Wafer Processing Lam Research EOS |
| 219 | Etch/Clean – Wet Processing Single Wafer Processing Tokyo Electron Ltd. Cellesta+ |
| 220 | Etch/Clean – Wet Processing Wafer Scrubber Dainippon Screen Mfg. Co. SS-3000 |
| 221 | Etch/Clean – Wet Processing Wafer Scrubber Dainippon Screen Mfg. Co. SS-3000 |
| 222 | Etch/Clean – Wet Processing Wafer Scrubber Dainippon Screen Mfg. Co. SS-3000 |
| 223 | Etch/Clean – Wet Processing Wafer Scrubber Dainippon Screen Mfg. Co. SS-3000 |
| 224 | Etch/Clean – Wet Processing Wafer Scrubber Dainippon Screen Mfg. Co. SS-3000 |
| 225 | Etch/Clean – Wet Processing Wafer Scrubber Tokyo Electron Ltd. NS 300Z |
| 226 | Fluid Dispensing Adhesive Dispenser Nordson Asymtek S2-930 |
| 227 | Furnaces/Diffusion Systems Vertical Anneal Furnace ASM International A412 Anneal |
| 228 | Furnaces/Diffusion Systems Vertical Anneal Furnace ASM International A412 Anneal |
| 229 | Furnaces/Diffusion Systems Vertical Anneal Furnace ASM International A412 Anneal |
| 230 | Furnaces/Diffusion Systems Vertical Anneal Furnace ASM International A412 Anneal |
| 231 | Furnaces/Diffusion Systems Vertical Anneal Furnace Tokyo Electron Ltd. ALPHA-303i Anneal |
| 232 | Furnaces/Diffusion Systems Vertical Anneal Furnace Tokyo Electron Ltd. ALPHA-303i Anneal |
| 233 | Furnaces/Diffusion Systems Vertical Anneal Furnace Tokyo Electron Ltd. TELINDY-B |
| 234 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Aviza Technology, Inc. RVP-300 |
| 235 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace II |
| 236 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace II |
| 237 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace II |
| 238 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace II |
| 239 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace II |
| 240 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace Ultimate ALD SiN |
| 241 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace Ultimate ALD SiN |
| 242 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace Ultimate ALD SiN |
| 243 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace Ultimate ALD SiN |
| 244 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace Ultimate ALD SiN |
| 245 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Quixace Ultimate ALD SiN |
| 246 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Zestone-III(C) DJ-1223V |
| 247 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Zestone-III(C) DJ-1223V |
| 248 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Zestone-III(C) DJ-1223V |
| 249 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Zestone-III(C) DJ-1223V |
| 250 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Kokusai Electric Co., Ltd. Zestone-V(B) DJ-1205V |
| 251 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Tokyo Electron Ltd. ALPHA-303i |
| 252 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Tokyo Electron Ltd. TELFORMULA |
| 253 | Furnaces/Diffusion Systems Vertical Diffusion Furnace Tokyo Electron Ltd. TELFORMULA |
| 254 | Furnaces/Diffusion Systems Vertical Furnace – Other Tokyo Electron Ltd. TELINDY Plus ALD High-K |
| 255 | Furnaces/Diffusion Systems Vertical Furnace – Other Tokyo Electron Ltd. TELINDY Plus ALD High-K |
| 256 | Furnaces/Diffusion Systems Vertical Furnace – Other Tokyo Electron Ltd. TELINDY Plus ALD High-K |
| 257 | Furnaces/Diffusion Systems Vertical Furnace – Other Tokyo Electron Ltd. TELINDY Plus ALD High-K |
| 258 | Furnaces/Diffusion Systems Vertical Furnace – Other Tokyo Electron Ltd. TELINDY Plus ALD High-K |
| 259 | Furnaces/Diffusion Systems Vertical Furnace – Other Tokyo Electron Ltd. TELINDY Plus ALD High-K |
| 260 | Furnaces/Diffusion Systems Vertical Furnace – Other Tokyo Electron Ltd. TELINDY Plus ALD High-K |
| 261 | Furnaces/Diffusion Systems Vertical Furnace – Other Tokyo Electron Ltd. TELINDY Plus ALD High-K |
| 262 | Furnaces/Diffusion Systems Vertical LPCVD Furnace ASM International A412 Doped Poly |
| 263 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II ALD High-k |
| 264 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II ALD High-k |
| 265 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II ALD High-k |
| 266 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II ALD High-k |
| 267 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II ALD High-k |
| 268 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Doped Poly |
| 269 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Doped Poly |
| 270 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Doped Poly |
| 271 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Doped Poly |
| 272 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Doped Poly |
| 273 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 274 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 275 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 276 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 277 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 278 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 279 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 280 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 281 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 282 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 283 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 284 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 285 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 286 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 287 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace II Nitride |
| 288 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace Nitride |
| 289 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Kokusai Electric Co., Ltd. Quixace Nitride |
| 290 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 291 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 292 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 293 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 294 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 295 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 296 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 297 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 298 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 299 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 300 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 301 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 302 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 303 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 304 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 305 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 306 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA ALD High-K |
| 307 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 308 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 309 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 310 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 311 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 312 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 313 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 314 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 315 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 316 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 317 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 318 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 319 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 320 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 321 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 322 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 323 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 324 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 325 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 326 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 327 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 328 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELFORMULA Nitride |
| 329 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELINDY IRAD ALD Oxide |
| 330 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELINDY IRAD ALD Oxide |
| 331 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELINDY Oxide |
| 332 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELINDY Oxide |
| 333 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELINDY Plus IRAD Oxide |
| 334 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELINDY Plus Nitride |
| 335 | Furnaces/Diffusion Systems Vertical LPCVD Furnace Tokyo Electron Ltd. TELINDY Plus Oxide |
| 336 | Furnaces/Diffusion Systems Vertical Nitride Furnace Tokyo Electron Ltd. ALPHA-303i Nitride |
| 337 | Furnaces/Diffusion Systems Vertical Nitride Furnace Tokyo Electron Ltd. ALPHA-303i Nitride |
| 338 | Furnaces/Diffusion Systems Vertical Nitride Furnace Tokyo Electron Ltd. ALPHA-303i Nitride |
| 339 | Furnaces/Diffusion Systems Vertical Nitride Furnace Tokyo Electron Ltd. ALPHA-303i Nitride |
| 340 | Furnaces/Diffusion Systems Vertical Nitride Furnace Tokyo Electron Ltd. ALPHA-303i Nitride |
| 341 | Furnaces/Diffusion Systems Vertical Nitride Furnace Tokyo Electron Ltd. ALPHA-303i Nitride |
| 342 | Information Technology Office miscellaneous furniture Office Tables and Chairs |
| 343 | Inspection Lead Inspection Equipment Advanced Technology Inc. Cypress |
| 344 | Inspection Lead Inspection Equipment Advanced Technology Inc. Cypress GEN2 |
| 345 | Inspection Lead Inspection Equipment ICOS (KLA-Tencor Corp.) ICOS T830 |
| 346 | Inspection Wire bond inspection (3VI/3O) FA Systems Automation (S) Pte Ltd. Wire Bond Inspection |
| 347 | Ion Implanters High Current Implanter Applied Materials Quantum X Plus |
| 348 | Ion Implanters High Current Implanter Axcelis Technologies Inc. Purion H2 |
| 349 | Ion Implanters High Dose Implant Varian Semiconductor Equipment Associates VIISta PLAD |
| 350 | Ion Implanters High Energy Implanter Axcelis Technologies Inc. HE3 |
| 351 | Ion Implanters High Energy Implanter Varian Semiconductor Equipment Associates VIISta 3000 |
| 352 | Ion Implanters Mid Current Implanter Nissin Electric Co., Ltd. EXCEED 2300 |
| 353 | Ion Implanters Mid Current Implanter Nissin Electric Co., Ltd. EXCEED 2300 |
| 354 | LED Test LED Die Prober MPI Corporation LEDA P6801 |
| 355 | LED Wafer Saw Wafer Breaker Tecdia Inc. TEC-1228AL |
| 356 | Metrology Equipment Atomic Force Microscope (AFM) Veeco Instruments Inc. Dimension 7000 |
| 357 | Metrology Equipment Atomic Force Microscope (AFM) Veeco Instruments Inc. Dimension X1D |
| 358 | Metrology Equipment Atomic Force Microscope (AFM) Veeco Instruments Inc. Dimension X1D |
| 359 | Metrology Equipment Atomic Force Profiler (AFP) Veeco Instruments Inc. Dimension Vx 340 |
| 360 | Metrology Equipment Brightfield Inspection Applied Materials Uvision 200 |
| 361 | Metrology Equipment Brightfield Inspection Applied Materials Uvision 200 |
| 362 | Metrology Equipment Brightfield Inspection Applied Materials Uvision 4 |
| 363 | Metrology Equipment Brightfield Inspection KLA-Tencor Corp. |
| 364 | Metrology Equipment Brightfield Inspection KLA-Tencor Corp. |
| 365 | Metrology Equipment Critical Dimension (CD) Measurement (non SEM) Nanometrics Inc. Atlas II+ |
| 366 | Metrology Equipment Critical Dimension (CD) Measurement (non SEM) Nanometrics Inc. LYNX |
| 367 | Metrology Equipment Darkfield Inspection KLA-Tencor Corp. Puma 9120 |
| 368 | Metrology Equipment Darkfield Inspection KLA-Tencor Corp. Puma 9120 |
| 369 | Metrology Equipment Darkfield Inspection KLA-Tencor Corp. Puma 9650 |
| 370 | Metrology Equipment E-beam Inspection Hermes Microvision (HMI) eP3 XP |
| 371 | Metrology Equipment E-beam Inspection Hermes Microvision (HMI) eP3 XP |
| 372 | Metrology Equipment E-beam Inspection Hermes Microvision (HMI) eP3 XP |
| 373 | Metrology Equipment E-beam Inspection Hermes Microvision (HMI) eP3 XP |
| 374 | Metrology Equipment E-beam Inspection KLA-Tencor Corp. eS20XP |
| 375 | Metrology Equipment E-beam Inspection KLA-Tencor Corp. eS32 |
| 376 | Metrology Equipment E-beam Inspection KLA-Tencor Corp. eS37 |
| 377 | Metrology Equipment Film Thickness Measurement System KLA-Tencor Corp. SpectraFX 200 |
| 378 | Metrology Equipment Film Thickness Measurement System Nanometrics Inc. Tevet Trajectory T3 |
| 379 | Metrology Equipment Film Thickness Measurement System Nanometrics Inc. Tevet Trajectory T3 |
| 380 | Metrology Equipment Film Thickness Measurement System ReVera RVX1000 |
| 381 | Metrology Equipment Film Thickness Measurement System ReVera RVX1000 |
| 382 | Metrology Equipment Film Thickness Measurement System ReVera RVX1000 |
| 383 | Metrology Equipment Film Thickness Measurement System Rudolph Technologies, Inc. S3000S |
| 384 | Metrology Equipment Film Thickness Measurement System Rudolph Technologies, Inc. S3000S |
| 385 | Metrology Equipment Implant Dosing Measurement CAMECA EX-300 |
| 386 | Metrology Equipment Macro-Defect Nikon AMI-3000 |
| 387 | Metrology Equipment Macro-Defect Nikon AMI-3000 |
| 388 | Metrology Equipment Macro-Defect Nikon AMI-3300 |
| 389 | Metrology Equipment Macro-Defect Nikon AMI-3300 |
| 390 | Metrology Equipment Macro-Defect Nikon AMI-3500 |
| 391 | Metrology Equipment Macro-Defect Nikon AMI-3500 |
| 392 | Metrology Equipment Macro-Defect Olympus AL3100 |
| 393 | Metrology Equipment Macro-Defect Rudolph Technologies, Inc. NSX 105 |
| 394 | Metrology Equipment Macro-Defect Rudolph Technologies, Inc. NSX 105 |
| 395 | Metrology Equipment Macro-Defect Rudolph Technologies, Inc. NSX 105 |
| 396 | Metrology Equipment Macro-Defect Rudolph Technologies, Inc. NSX 105 |
| 397 | Metrology Equipment Macro-Defect Rudolph Technologies, Inc. NSX 105 |
| 398 | Metrology Equipment Macro-Defect Rudolph Technologies, Inc. NSX 105 |
| 399 | Metrology Equipment Macro-Defect Rudolph Technologies, Inc. NSX 105 |
| 400 | Metrology Equipment Microscope Carl Zeiss Group Axiotron 300 |
| 401 | Metrology Equipment Microscope Leica Inc. INM20 |
| 402 | Metrology Equipment Microscope Leica Inc. INS10 |
| 403 | Metrology Equipment Microscope Nikon OPTIPHOT 200 |
| 404 | Metrology Equipment Optical Review System Nikon OPTISTATION 3100 |
| 405 | Metrology Equipment Optical Review System Nikon OPTISTATION 3100 |
| 406 | Metrology Equipment Optical Review System Nikon OPTISTATION V |
| 407 | Metrology Equipment Optical Review System Nikon OPTISTATION V |
| 408 | Metrology Equipment Overlay Measurement System ASML YieldStar S-200B |
| 409 | Metrology Equipment Overlay Measurement System KLA-Tencor Corp. Archer 300 AIM |
| 410 | Metrology Equipment Overlay Measurement System KLA-Tencor Corp. Archer 300+ AIM |
| 411 | Metrology Equipment Particle Measurement KLA-Tencor Corp. Surfscan SP2 |
| 412 | Metrology Equipment Parts/Options KLA-Tencor Corp. KLA-TENCOR DUAL OPEN HANDLER |
| 413 | Metrology Equipment Parts/Options KLA-Tencor Corp. KLA-TENCOR DUAL SMIF HANDLER |
| 414 | Metrology Equipment Parts/Options KLA-Tencor Corp. KLA-TENCOR DUAL SMIF HANDLER |
| 415 | Metrology Equipment SEM – Critical Dimension (CD) Measurement Applied Materials VeritySEM 2 |
| 416 | Metrology Equipment SEM – Critical Dimension (CD) Measurement Applied Materials VeritySEM 2 |
| 417 | Metrology Equipment SEM – Critical Dimension (CD) Measurement Applied Materials VeritySEM 2 |
| 418 | Metrology Equipment SEM – Critical Dimension (CD) Measurement Applied Materials VeritySEM 2 |
| 419 | Metrology Equipment SEM – Critical Dimension (CD) Measurement Hitachi (Semiconductor) CG-4100 |
| 420 | Metrology Equipment SEM – Critical Dimension (CD) Measurement Hitachi (Semiconductor) CG-4100 |
| 421 | Metrology Equipment SEM – Critical Dimension (CD) Measurement Hitachi (Semiconductor) CG-4100 |
| 422 | Metrology Equipment SEM – Defect Review (DR) Hitachi (Semiconductor) RS-6000 |
| 423 | Metrology Equipment SEM – Defect Review (DR) JEOL JWS-7555 |
| 424 | Metrology Equipment Spectrometry Agilent Technologies Inc. 7500 |
| 425 | Metrology Equipment Spectrometry Technos TVD-900 ICP-MS |
| 426 | Metrology Equipment TEM FEI Company Tecnai G2 F30 |
| 427 | Metrology Equipment Temperature Desorption Analyzer ESCO Ltd. EMD-WA1000S |
| 428 | Metrology Equipment Wafer Characterization KLA-Tencor Corp. WaferSight |
| 429 | Metrology Equipment X-ray Fluorescence Spectrometer Oxford Instruments X-Strata980 |
| 430 | Metrology Equipment X-ray Reflectivity (XRR) Rigaku MFM310 |
| 431 | PC Cards Graphics Cards MSI GT 710-1GD3H LP |
| 432 | PC Cards Graphics Cards MSI N210-MD1G/D3 |
| 433 | Power Supplies PC Power Supplies EVGA Corporation 850 GQ |
| 434 | Power Supplies PC Power Supplies EVGA Corporation Supernova 1300 G2 |
| 435 | Power Supplies PC Power Supplies SilverStone Technology Co SST-ST45SF |
| 436 | Power Supplies PC Power Supplies Thermaltake Technology Toughpower 750W Gold |
| 437 | Reliability Lab Environmental Chamber Espec EGNU28-12CWL |
| 438 | Reliability Lab Environmental Chamber Espec ESX-3CW |
| 439 | Reliability Lab Environmental Chamber Espec IPHH-201 |
| 440 | Reliability Lab Environmental Chamber Espec IPHH-201 |
| 441 | Reliability Lab Scanning Acoustic Microscopy (SAM) / Tomography (SAT) Sonoscan FACTS2 DF2300 C-SAM (DAC305A) |
| 442 | Reliability Lab Scanning Acoustic Microscopy (SAM) / Tomography (SAT) Sonoscan FACTS2 DF2300 C-SAM (DAC305A) |
| 443 | Resist Processing Equipment Multi Block (Resist Coater/Developer) Sokudo Co., Ltd. RF-300A |
| 444 | Resist Processing Equipment Multi Block (Resist Coater/Developer) Tokyo Electron Ltd. CLEAN TRACK LITHIUS i+ |
| 445 | Resist Processing Equipment Spin On Dielectric (SOD) Tokyo Electron Ltd. CLEAN TRACK ACT 12 SOD |
| 446 | Sawing Laser Saw Disco Hi-Tec DFL7361 |
ID-SS5319-0-7
