Description
Please contact us for the availability of the used Plasmatherm Dual Chamber 790 PECVD RIE semiconductor process Equipment.
Plasmatherm Dual Chamber 790 PECVD & RIE system, Manual load, Non-Loadlock system,RFPP – RF5S RF power supply with matching network & a second RF 350W power supply, Leybold turbo pump,Plasmatherm Windows based operating system,Gas distribution panel consisting of 4 MFCs per process side.
The items are subject to prior sale without notice. These items are only for end users.
SS5512

