Description
Please contact us for the availability of the Plasmatherm 790 MF used semiconductor equipment.
Plasma RIE Reactive Ion Etch System. PC controlled plasma etching system. Single process chamber with shower head style gas input and a 7 in. dia. platen. 500W, 13.56 MHz RF generator. Five MFC gas flow channels, previous gases used: HC-23, N2, 02, SF6. Roughing pump with blower. Does not include water chiller.
The items are subject to prior sale without notice. These items are only for end users.
SS5626