Top

PLASMA SCIENCES R.I.E. 200W

Description

Please contact us for the availability of the used PLASMA SCIENCES R.I.E. 200W semiconductor process Equipment.

PLASMA SCIENCES R.I.E. 200W , TABLE TOP REACTIVE ION ETCHER , ONE WAFER UP TO 6″ DIAMETER PER CYCLE. TURBO PUMPED MICROPROCESSOR, CONTROLLED ROUGHING PUMP  MFC CONTROLS FOR 3 GASES.

The items are subject to prior sale without notice. These items are only for end users.

Please contact us for more information on the product:

Your Name*:

Your Email:

Your Message:

Captchac Codecaptcha

Submit:

SS2424

The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers