Description
PECVD tool for aSi, cSi and cGe
Load locked, 2 chamber PECVD system for aSi, cSi and cGe deposition for photovoltaic / solar cell manufacturing. Originally manufactured by MVSystems. Has been used to deposit up to 8″/200mm silicon wafers. Can deposit intrinsic as well as doped layers with up to 6 mass flow controllers per chamber. Film quality and cleanliness is ensured by turbopumping all chambers to high vacuum, pick and place transfer mechanism between chambers, and product transfer between chambers under high vacuum, and residual gas analysis in each process chamber. Complete system available with main process chamber unit, gas mixing manifold, process gas supply cabinets, and exhaust gas dry abatement treatment system.
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- MKS type 653B throttle valve (2)
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Valid Time: Subject to prior sale without notice.
SS302027684821
