Description
Please contact us for the availability of the Oxford Instruments Plasmalab 800 Plus RIE used semiconductor equipment.
Large Capacity Open Loaded Reactive Ion Etching System. PC controller provides intuitive user interaction with the system via advanced graphics and process recipe pages. Footprint is kept to a minimum by locating all electronics and vacuum components within the body of the tool. Mass flow controllers are housed separately in a wall mounted gas pod. Four MFC gas controllers, previous gases O2, CF4, Ar, CHF3. A 460mm dia. electrode ideally suited for batch processes or single wafer processes with excellent uniformity across chamber. 18.75 in. dia. top electrode with shower head gas delivery. Vacuum system includes turbo pump and dry pump. Mfg. 2010, nice condition.
The items are subject to prior sale without notice. These items are only for end users.
SS5626