Description
Please contact us for the availability of the Nexx Systems Cirrus 300 used Semiconductor Equipment.
Manufacturer: Nexx Systems
Model: Cirrus 300
Description: CVD Deposition with ECR source
Wafer Size Range: Minimum 50 mm, Maximum 300 mm
Controller Type: PC Controller Type
Loadlock:YES
High Vacuum Pump: Balzers TMH 1001corrosive service Turbo
Automatch :Text ASTeX AX3060
Chillers: Number of Chillers 1: Chiller #1Manufacturer/Model Neslab – HX 75
Other Information :PQ2000 Series permanent magnet low profile ECR source.
ASTeX AX2110 microwave power supply with remote magnetron head.
Output 150 – 1000 Watt, PC controlled
20 inch outer diameter reactor chamber with Viton seals.
Six (6) MKS Instruments 2179A Kalrez sealed mass flow controllers, expandable to seven.
Wafer Chuck
Handling up to 300mm in diameter
RF Biased, Via RFPP 1kW, 13.56 Mhz, with automatch
Recirculating fluid cooling
Helium backside cooling
Temperature range -25C to 130C
Mechanical clamp substrate holder
NB: Higher temperatures can be achieved without helium backside cooling
Operating Air Pressure 80.00 PSI (551,624.00 N/sq m)
Year of Manufacture 2000
Condition Excellent
The items are subject to prior sale without notice. These items are only for end users.
SS5732
