Description
Please contact us for the availability of the Mill Lane Eng 4123 Reel Sputter/Etch System used Semiconductor Equipment.
The model 412-3 is a two-chamber reel to reel web coater which deposits metal or alloys on wire or ribbon substrates by sputtering from two magnetron targets arranged in a closely spaced book array. Capacity is based upon 4″ ID x 12″ OD x 3″ wide wire/ribbon spools. Wire diameter up to 0.035″ (.9mm) may be coated at speeds ranging between 2 and 40 feet per minute depending on the coating thickness desired. Constant wire speed and tension are controlled in conjunction with other parameters which enable unattended operation for extended periods. A second chamber provides plasma pre cleaning prior to entering the sputter zone through a conductance limiting tube which allows different gas compositions and pressures for cleaning and coating.
The items are subject to prior sale without notice. These items are only for end users.
SS5732