Description
Magnetron Sputter
magnetron sputter adopts a coherent method by simultaneously activating two sputter guns and can also have an additional (third) sputter gun if needed.
• Initial Vacuum Degree: 10-5 Torr
• Vacuum Degree During Sputtering: 10-3 Torr
• Main chamber pumping unit
–Diffusion pump
–Rotary pump (400 liter/min)
–Main valve (pneumatic)
–Angle valve(pneumatic)
–Auto vent valve
–Bellows ( 1m)
–Clamp & centering set
• Sputter gun
–Target size : 2″ dia.
–Pneumatic shutter
• Vacuum measurement unit
–High vacuum level : ion gauge, 1ea
–Low vacuum level : convection gauge, 2ea
–Display controller
• DC power supply
–Max power : 1kW
• RF power supply & matching network
Max. power : 600w
• Gas supply unit
–Mass flow controller : Ar(100sccm)
–MFC readout
–Gas valve (diaphragm, pneumatic), 2ea
–Gas tube & fitting
–Main chamber
• Chamber, heating stage, controller & frame
•Material : SUS304
•One(1) pumping port
•One(1) heating stage port
•One(1) view port with window & shutter
•Four(4) gas inlet, gauge port
•Three(3) sputter gun port
–Substrate heating stage
•Max temp. : to 600 degree C
•Substrate size : 4″ dia.
•Motorized rotation
•Pneumatic shutter
–System controller & heater controller
•All power control, pneumatic valve control
•PID temperature control
•Cooling water, pneumatic operation interlock
–System support frame
•Main chamber support frame
Electronics rack : 19″
Valid Time: Subject to prior sale without notice.
SS331782147268
