Description
Please contact us for the availability of the following used Low Pressure CVD System (LPCVD SYSTEM) semiconductor equipment
Info from OEM for your reference only.
The LPCVD systems can uniformly deposit many thin film materials, including wide bandgap semiconductors, silicon carbide (SiC), nitrides, oxides, poly and epi silicon, transparent conductive oxides (TCOs), graphene, Si/SiGe epitaxial films, metallic and ceramic films, etc. The LPCVD systems are also used for nanomaterials synthesis including carbon nanotubes, graphene, semiconducting nanowires, and 2D crystals including boron nitride and molybdenum disulfide. LPCVD coatings typically exhibit excellent uniformity, high purity, and good step coverage.
The OEM applyes different vacuum system technologies depending on the requirements of the process. Vacuum systems are selected based on the types of chemistries involved and process pressure requirements. These vacuum system solutions are designed to be low maintenance, robust, and reliable. Vacuum systems are integrated into a central control and safety system.
The item is only for end user. The item is subject to prior sale without notice.
SS5965