Lam Research Rainbow 4520 Envision Software ESC 150MM Tool

The Lam Research Rainbow 4520 Standalone System is a single wafer, vacuum load-locked low pressure oxide etch system for etching 0.5um Contact holes at aspect ratios of <4:1. This system features a low pressure main chamber for anisotropic etching of dielectric films with low conductance manifold, pick and place wafer transport system with non-wafer contact optical alignment, flat or notch orientation and active temperature control of upper and lower electrodes. The process makes use of a low polymer forming chemistry for high selectivity to polysilicon. The system can also include a Monochromator for automatic endpoint on exposed oxide.

Features

• Single Wafer Etching
• Wafer Temperature Control
• Variable Gap Spacing
• Parallel Plate Reactor
• Inductive RF Auto Tuning
• Simple and Efficient Design

Applications:

1. Contact Etch
2. Planarization
3. Via Etch
4. Trench Mask Etch
5. Pad Etch

Benefits:

• Individual Wafer Etch for Repeatable Results
• Reduced Loading Effects
• Profile Control
• Extended Over Etch Capable
• End Point Detector
• Wide Process Window
• Proven Oxide Etch Technology
• Fast, Accurate RF Tuning for Precise Etch Rate Control
• Reduced Defect Densities
• Ease of Maintenance
• Low Cost Of Ownership