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FirstNano EasyTube 3000 Chemical Vapor Deposition Tool CVD Equipment Corp

FirstNano EasyTube 3000 Chemical Vapor Deposition Tool CVD Equipment Corp

Our On Sale Equipment in stock

Category: DC RF Power Matching

Description

Description

FirstNano EasyTube 3000 Chemical Vapor Deposition Tool CVD Equipment Corp

Condition: Used. We sell it at AS IS,WHERE IS.

Description from OEM for your reference only.

Rapid thermal processing (RTP) is required when there is a reduced thermal budget, for example in dopant activation. RTP also allows for reduced process cycle times, hence higher production throughput.

FirstNano® EasyTube® CVD systems can be configured with Rapid Thermal Processing (RTP) capability, including single and multi-zone systems using orthogonal linear, parallel linear, or axisymmetrical infrared lamps. Our RTP systems can process at temperatures from 400 °C up to > 1300 °C. Fast response and low thermal mass allows for temperature ramping > 100 °C / second.

RTP is used for oxidation, annealing, deposition of silicon dioxide and silicon nitride, contact alloying, tin oxide, gallium arsenide implant activation, phosphate silicate glass (PSG) and boron phosphate silicate glass (BPSG) reflow, silicon dielectrics, and many other processes.

FirstNano® system platforms configurable for RTP.

EasyTube® 2000 (50 mm x 50 mm Substrate)

EasyTube® 3000 (100 mm x 100 mm Substrate)

This Item is subject to prior sale without notice.Photos are only for reference.

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