Description
Please contact us if you are interested in the following Etching Equipment . The Etching Equipment are only for end users and are subject to prior sale without notice. Appreciate your time.
| Equip Code | Name | Type |
| 37 | 790 Plasmatherm #1 RIE | RIE |
| 38 | 790 Plasmatherm #2 RIE | RIE |
| 40 | 80+ RIE | RIE |
| 54 | Acid Bench – multiple wafer processing | Wet Bench |
| 55 | Acid Benches | Wet Bench |
| 56 | Acid Process Bench 1 | Wet Bench |
| 57 | Acid Process Wetbench | Wet Bench |
| 58 | Acid Wet Bench | Wet Bench |
| 59 | ACIDHOOD1 | Wet Bench |
| 60 | ACIDHOOD2 | Wet Bench |
| 61 | ACIDHOOD3 | Wet Bench |
| 100 | Air Control Wet Bench | Wet Bench |
| 108 | AJA Ion Mill | Ion Mill |
| 131 | Americhem Eng Polypro Wet Bench | Wet Bench |
| 137 | AMT Oxide Plasma Etcher | RIE |
| 139 | Anatech Barrel Plasma System | RIE |
| 141 | Anatech SCE 106 (DE-07) | Other |
| 152 | Applied Materials P5000 Etcher | RIE |
| 163 | Ashers | Other |
| 211 | Base Development Bench | Wet Bench |
| 212 | Base Process Bench | Wet Bench |
| 213 | Base Process Wetbench | Wet Bench |
| 214 | Base Wet Bench | Wet Bench |
| 215 | Batchtop RIE | RIE |
| 220 | BATH3 | Wet Bench |
| 221 | BATH4 | Wet Bench |
| 317 | Chlroine & Flourine Metal Etching System | RIE |
| 404 | Deep Reactive Ion Etcher (DRIE) | Deep Silicon (Bosch) |
| 405 | Deep Reactive Ion Etching | Other |
| 406 | Deep Reactive Ion Etching System – Alcatel AMS 100 | Deep Silicon (Bosch) |
| 407 | Deep Reactive Ion Etching System – STS MESC Multiplex ICP | Deep Silicon (Bosch) |
| 408 | Deep RIE | Deep Silicon (Bosch) |
| 409 | Deep Trench Etcher | ICP |
| 433 | Developing Wet Bench | Wet Bench |
| 440 | Dielectric Etcher | RIE |
| 473 | DRIE | Deep Silicon (Bosch) |
| 474 | DRIE | Deep Silicon (Bosch) |
| 478 | Drytek 100 Plasma Etcher | RIE |
| 479 | Drytek 100 Plasma Etcher | RIE |
| 515 | EDP Wet Bench | Wet Bench |
| 616 | FIB | FIB |
| 640 | Fischione Ion Mill | Ion Mill |
| 642 | Flexible Corrosive Wetbench and GaAs | Wet Bench |
| 652 | Focused Ion Beam (FIB) | FIB |
| 690 | Gasonics Asher | Other |
| 691 | Gasonics Asher (Inorganic) | Other |
| 692 | Gasonics Aura Asher | RIE |
| 704 | General Wet Process Station | Wet Bench |
| 724 | Hamatech Mask Chrome Etch 1 | Other |
| 725 | Hamatech Mask Chrome Etch 2 | Other |
| 727 | Hamatech Wafer Processor Develop 1 | Other |
| 728 | Hamatech Wafer Processor Develop 2 | Other |
| 756 | HF Process Bench | Wet Bench |
| 785 | HOOD1 | Wet Bench |
| 786 | HOOD2 | Wet Bench |
| 787 | HOOD3 | Wet Bench |
| 795 | Hot Phosphoric Tank | Other |
| 808 | Hydrofluoric (HF) Vapor Etcher | Other |
| 816 | IBM | Ion Mill |
| 821 | ICP – Chlorine | ICP |
| 822 | ICP – Fluorine | ICP |
| 823 | ICP 2300 Versys LAM | ICP |
| 824 | ICP STS | ICP |
| 826 | ICP100 | Deep Silicon (Bosch) |
| 853 | Ion Beam Etcher | Ion Mill |
| 856 | Ion Mill | Ion Mill |
| 858 | Ion miller | Ion Mill |
| 945 | KOH baths for wafer Polishing and Texturing | Wet Bench |
| 946 | KOH Hood and Bath | Wet Bench |
| 960 | Lam Rainbow 4400 RIE | RIE |
| 961 | Lam Research TCP 9400 Poly Etcher | ICP |
| 1052 | March 1703 | RIE |
| 1053 | March Asher | Other |
| 1078 | Matrix Plasma Asher | RIE |
| 1079 | Matrix Plasma Resist Strip | RIE |
| 1084 | Memsstar Orbis Alpha Oxide Etch System | Deep Oxide |
| 1086 | Metal Wetbench | Wet Bench |
| 1133 | Microwave plasma asher | Other |
| 1134 | Microwave induced plasma etcher | Other |
| 1137 | milling: Intlvac Ion Mill | Ion Mill |
| 1161 | MRC Reactive Ion Etcher | RIE |
| 1221 | Nexx RIE | RIE |
| 1241 | Oerlikon Versaline Deep Si Etcher | Deep Silicon (Bosch) |
| 1276 | Oxford 100 Etcher | RIE |
| 1277 | Oxford 81 Etcher | RIE |
| 1278 | Oxford 82 Etcher | RIE |
| 1280 | Oxford Cobra ICP Etcher | RIE |
| 1281 | Oxford Cryogenic ICP | ICP |
| 1282 | Oxford Dielectric Etcher | RIE |
| 1283 | Oxford End-point RIE | RIE |
| 1284 | Oxford Etcher | ICP |
| 1285 | Oxford ICP | ICP |
| 1286 | Oxford ICP-PECVD | ICP |
| 1287 | Oxford ICP100 | ICP |
| 1288 | Oxford III-V etcher | ICP |
| 1292 | Oxford Plasmalab 80 (Cloey) | RIE |
| 1293 | Oxford Plasmalab 80 (Floey) | RIE |
| 1294 | Oxford PlasmaLab 80+ (DE-04) | RIE |
| 1295 | Oxford PlasmaLab 80+ (Unit 2) | RIE |
| 1296 | Oxford Reactive Ion Etcher RIE | RIE |
| 1297 | Oxidation Diffusion Wetbench | Wet Bench |
| 1370 | PLAP1 | Other |
| 1372 | Plasma -Therm Diamond RIE | ICP |
| 1386 | Plasma Lab 80+ PECVD and Etching | RIE |
| 1387 | Plasma Quest ECR Etcher | ICP |
| 1388 | Plasma Therm ICP | ICP |
| 1390 | Plasma Therm RIE | RIE |
| 1391 | Plasma Therm SLR RIE | RIE |
| 1392 | Plasma Therm Versaline DSE | Deep Silicon (Bosch) |
| 1393 | Plasma Therm Versaline LL ICP Deep Silicon Etcher | Deep Silicon (Bosch) |
| 1394 | Plasma Therm Versaline LL ICP Dielectric Etcher | ICP |
| 1395 | Plasma Therm Versaline LL ICP Metal Etcher | ICP |
| 1399 | Plasma-Therm ICP Chlorine Etch | ICP |
| 1400 | Plasma-Therm ICP Fluoride Etch | ICP |
| 1401 | Plasma-Therm Versaline Deep Si RIE | Deep Silicon (Bosch) |
| 1405 | Plasmatherm 790 RIE | RIE |
| 1406 | Plasmatherm APEX ICP | ICP |
| 1435 | Primaxx Vapor HF Etcher | Other |
| 1450 | PT72 Etcher | RIE |
| 1451 | PT720 Etcher | RIE |
| 1452 | PT740 Etcher | RIE |
| 1453 | PT770 Etcher – Left Side (Silicon) | ICP |
| 1454 | PT770 Etcher – Right Side (III-V) | ICP |
| 1514 | Reaction Ion Etching System II – PlasmaTherm | RIE |
| 1515 | Reactive Ion Etcher | RIE |
| 1516 | Reactive Ion Etcher (RIE) Samco RIE-10NR | RIE |
| 1517 | Reactive Ion Etching System I – Semi Group RIE | RIE |
| 1518 | Reactive Ion Etching System I – Semi Group RIE | RIE |
| 1519 | Reactive Ion Etching System III – Trion | RIE |
| 1539 | RIE | RIE |
| 1540 | RIE etching system | RIE |
| 1541 | RIE1 | RIE |
| 1542 | RIE2 | RIE |
| 1543 | RIE3 | Deep Silicon (Bosch) |
| 1544 | RIE: Oxford PlasmaPro 80 | RIE |
| 1569 | Samco UV & Ozone Stripper | RIE |
| 1673 | Solvent Benches | Wet Bench |
| 1678 | Solvent Wetbench | Wet Bench |
| 1682 | SOLVHOOD1 | Wet Bench |
| 1683 | SOLVHOOD2 | Wet Bench |
| 1684 | SOLVHOOD3 | Wet Bench |
| 1686 | South Bay RIE | RIE |
| 1721 | SPTS Deep Silicon Etch (DE-03) | Deep Silicon (Bosch) |
| 1722 | SPTS Rapier DRIE | Deep Silicon (Bosch) |
| 1723 | SPTS uEtch HF Vapor Etcher | Other |
| 1724 | SPTS uetch vapor etch | Other |
| 1725 | SPTS Xactix Xetch (DE-06) | Other |
| 1726 | SPTS-DRIE | Deep Silicon (Bosch) |
| 1759 | STS AOE ICP | ICP |
| 1760 | STS Deep RIE Etcher | Deep Silicon (Bosch) |
| 1761 | STS Etcher | RIE |
| 1762 | STS HRM ICP | ICP |
| 1763 | STS ICP | Deep Silicon (Bosch) |
| 1764 | STS ICP | ICP |
| 1765 | STS ICP | ICP |
| 1766 | STS ICP RIE | ICP |
| 1767 | STS Multiplex Inductively Coupled Plasma Etch System | ICP |
| 1771 | STS Pegasus ICP | Deep Silicon (Bosch) |
| 1773 | STS SOE ICP | ICP |
| 1811 | Technics Micro PD — Instructional Center | Other |
| 1812 | Technics Micro RIE — Organic Cleanroom | RIE |
| 1813 | Technics Plasma Stripper/Cleaner | RIE |
| 1820 | Tegal 411 | Other |
| 1910 | TRION | RIE |
| 1911 | Trion | RIE |
| 1912 | Trion Etcher | ICP |
| 1913 | Trion Phantom | Other |
| 1914 | Trion RIE/ICP | ICP |
| 1956 | ULVAC Deep Oxide Etcher | Deep Oxide |
| 1958 | Unaxis 770 Deep Si Etcher | Deep Silicon (Bosch) |
| 1960 | Unaxis RIE | RIE |
| 1961 | Unaxis Shuttleline ICP RIE | RIE |
| 2002 | Vision RIE 1 | RIE |
| 2003 | Vision RIE 2 | RIE |
| 2004 | Vision-RIE | RIE |
| 2010 | WAFAB Acid/Base Bench | Wet Bench |
| 2014 | WAFAB HF/TMAH Bench | Wet Bench |
| 2016 | WAFAB Toxic Corrosives Bench | Wet Bench |
| 2074 | Xactix XeF2 Etcher | Other |
| 2075 | Xactix XeF2 etcher | Other |
| 2076 | Xactix Xenon Difluoride Etcher | Other |
| 2077 | Xactix Xenon Difluoride Etcher | Other |
| 2078 | Xactix Xenon Difluoride Etcher | Other |
| 2081 | XeF2 etcher | RIE |
| 2082 | XeF2 Etcher | Other |
| 2083 | XeF2 System | Other |
| 2084 | Xenon Difluoride Etcher | Other |
ss380nnci
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