Description
The following equipment are only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time!
Condition: Used
| 200 | Kokusai Electric Co., Ltd. | Quixace II Doped Poly | Vertical LPCVD Furnace |
| 201 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 202 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 203 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 204 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 205 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 206 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 207 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 208 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 209 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 210 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 211 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 212 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 213 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 214 | Kokusai Electric Co., Ltd. | Quixace II Nitride | Vertical LPCVD Furnace |
| 215 | Kokusai Electric Co., Ltd. | Quixace II Poly | Vertical LPCVD Furnace |
| 216 | Kokusai Electric Co., Ltd. | Quixace Nitride | Vertical LPCVD Furnace |
| 217 | Kokusai Electric Co., Ltd. | Quixace Nitride | Vertical LPCVD Furnace |
| 218 | Kokusai Electric Co., Ltd. | Zestone-III(C) DJ-1223V | Vertical Diffusion Furnace |
| 219 | Kokusai Electric Co., Ltd. | Zestone-III(C) DJ-1223V | Vertical Diffusion Furnace |
| 220 | Kokusai Electric Co., Ltd. | Zestone-III(C) DJ-1223V | Vertical Diffusion Furnace |
| 221 | Kokusai Electric Co., Ltd. | Zestone-III(C) DJ-1223V | Vertical Diffusion Furnace |
| 222 | Kokusai Electric Co., Ltd. | Zestone-III: DD-1223V | Vertical Diffusion Furnace |
| 223 | Kokusai Electric Co., Ltd. | Zestone-V(B) DJ-1205V | Vertical Diffusion Furnace |
| 224 | LAM Research | 2300 Exelan | Dielectric Etch |
| 225 | LAM Research | 2300 Exelan – TM Only | Dielectric Etch |
| 226 | LAM Research | 2300 Exelan Flex – Chamber Only | Dielectric Etch |
| 227 | LAM Research | 2300 Exelan Flex – Chamber Only | Dielectric Etch |
| 228 | LAM Research | 2300 Exelan Flex – Chamber Only | Dielectric Etch |
| 229 | LAM Research | 2300 Exelan Flex 45 | Dielectric Etch |
| 230 | LAM Research | 2300 Exelan Flex 45 | Dielectric Etch |
| 231 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch |
| 232 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch |
| 233 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch |
| 234 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch |
| 235 | LAM Research | 2300 Exelan Flex EX | Dielectric Etch |
| 236 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch |
| 237 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch |
| 238 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch |
| 239 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch |
| 240 | LAM Research | 2300 Exelan Flex EX+ | Dielectric Etch |
| 241 | LAM Research | 2300 KIYO EX Poly – Chamber Only | Polysilicon Etch |
| 242 | LAM Research | 2300 KIYO MCX | Metal Etch |
| 243 | LAM Research | 2300 KIYO MCX | Metal Etch |
| 244 | LAM Research | 2300 SELIS – Chamber Only | Dielectric Etch |
| 245 | LAM Research | 2300e5 KIYO 45 | Polysilicon Etch |
| 246 | LAM Research | 2300e5 KIYO 45 | Polysilicon Etch |
| 247 | LAM Research | 2300e5 KIYO 45 | Polysilicon Etch |
| 248 | Lam Research | EOS | Single Wafer Processing |
| 249 | Leica Inc. | INS3300 | Macro-Defect |
| 250 | Muratec Murata Machinery, Ltd. | SRC330 | Wafer Stocker |
| 251 | Nanometrics Inc. | Atlas II+ | Critical Dimension (CD) Measurement (non SEM) |
| 252 | Nanometrics Inc. | LYNX | Critical Dimension (CD) Measurement (non SEM) |
| 253 | Nanometrics Inc. | Tevet Trajectory T3 | Film Thickness Measurement System |
| 254 | Nanometrics Inc. | Tevet Trajectory T3 | Film Thickness Measurement System |
| 255 | Nikon | AMI-3000 | Macro-Defect |
| 256 | Nikon | AMI-3000 | Macro-Defect |
| 257 | Nikon | AMI-3300 | Macro-Defect |
| 258 | Nikon | AMI-3300 | Macro-Defect |
| 259 | Nikon | AMI-3500 | Macro-Defect |
| 260 | Nikon | AMI-3500 | Macro-Defect |
| 261 | Nikon | OPTISTATION 3100 | Optical Review System |
| 262 | Nikon | OPTISTATION 3100 | Optical Review System |
| 263 | Nissin Electric Co., Ltd. | EXCEED 2300 | Mid Current Implanter |
| 264 | Nissin Electric Co., Ltd. | EXCEED 2300 | Mid Current Implanter |
| 265 | Nissin Electric Co., Ltd. | EXCEED 3000AH | Mid Current Implanter |
| 266 | Nissin Electric Co., Ltd. | EXCEED 3000AH | Mid Current Implanter |
| 267 | Nissin Electric Co., Ltd. | EXCEED 3000AH | Mid Current Implanter |
| 268 | Nissin Electric Co., Ltd. | EXCEED 3000AH | Mid Current Implanter |
| 269 | Nissin Electric Co., Ltd. | EXCEED 3000AH | Mid Current Implanter |
| 270 | Nissin Electric Co., Ltd. | EXCEED 3000AH | Mid Current Implanter |
| 271 | Novellus Systems Inc. | Concept Three Altus Max | WCVD (Chemical Vapor Deposition) |
| 272 | Novellus Systems Inc. | Concept Three Altus Max EFX | WCVD (Chemical Vapor Deposition) |
| 273 | Novellus Systems Inc. | GAMMA Express | Stripper/Asher |
| 274 | Novellus Systems Inc. | GAMMA Express | Stripper/Asher |
| 275 | Oxford Instruments | Plasmalab 80 Plus | Multi-Process Etch |
| 276 | P.S.K. Tech Inc. | Supra IV | Stripper/Asher |
| 277 | P.S.K. Tech Inc. | Tigma N | Stripper/Asher |
| 278 | RECIF Technologies | SIS300 | Wafer Sorter |
| 279 | RECIF Technologies | SPP300 | Wafer Sorter |
| 280 | RECIF Technologies | SPP300 | Wafer Sorter |
| 281 | RECIF Technologies | SPP300 | Wafer Sorter |
| 282 | RECIF Technologies | SRT300 | Wafer Sorter |
| 283 | ReVera | RVX1000 | Film Thickness Measurement System |
| 284 | ReVera | RVX1000 | Film Thickness Measurement System |
| 285 | ReVera | RVX1000 | Film Thickness Measurement System |
| 286 | Rigaku | MFM310 | X-ray Reflectivity (XRR) |
| 287 | Rudolph Technologies, Inc. | S3000A | Ellipsometer |
| 288 | Rudolph Technologies, Inc. | S3000A | Ellipsometer |
| 289 | Rudolph Technologies, Inc. | S3000A | Ellipsometer |
| 290 | Rudolph Technologies, Inc. | S3000S | Film Thickness Measurement System |
| 291 | Rudolph Technologies, Inc. | S3000S | Film Thickness Measurement System |
| 292 | S.E.S. CO., LTD. | BW3000X | Batch Wafer Processing |
| 293 | S.E.S. CO., LTD. | BW3000X | Batch Wafer Processing |
| 294 | Semitool Inc. | Raider SP310 | Single Wafer Processing |
| 295 | SEZ Group | SP323 | Single Wafer Processing |
| 296 | Shibaura Engineering Works Ltd. | CDE-300 | Metal Etch |
| 297 | Showa Denko | abatement series | Chemical/Gas Treatment System |
| 298 | Sokudo Co., Ltd. | RF-300A | Multi Block (Resist Coater/Developer) |
| 299 | Tokyo Electron Ltd. | ALPHA-303i | Vertical Diffusion Furnace |
| 300 | Tokyo Electron Ltd. | ALPHA-303i Anneal | Vertical Anneal Furnace |
| 301 | Tokyo Electron Ltd. | ALPHA-303i Anneal | Vertical Anneal Furnace |
| 302 | Tokyo Electron Ltd. | ALPHA-303i Nitride | Vertical Nitride Furnace |
| 303 | Tokyo Electron Ltd. | ALPHA-303i Nitride | Vertical Nitride Furnace |
| 304 | Tokyo Electron Ltd. | ALPHA-303i Nitride | Vertical Nitride Furnace |
| 305 | Tokyo Electron Ltd. | ALPHA-303i Nitride | Vertical Nitride Furnace |
| 306 | Tokyo Electron Ltd. | ALPHA-303i Nitride | Vertical Nitride Furnace |
| 307 | Tokyo Electron Ltd. | ALPHA-303i Nitride | Vertical Nitride Furnace |
| 308 | Tokyo Electron Ltd. | Cellesta+ | Single Wafer Processing |
| 309 | Tokyo Electron Ltd. | CLEAN TRACK ACT 12 SOD | Spin On Dielectric (SOD) |
| 310 | Tokyo Electron Ltd. | CLEAN TRACK LITHIUS | Multi Block (Resist Coater/Developer) |
| 311 | Tokyo Electron Ltd. | CLEAN TRACK LITHIUS | Single Block (Coat/Develop) |
| 312 | Tokyo Electron Ltd. | CLEAN TRACK LITHIUS i+ | Multi Block (Resist Coater/Developer) |
| 313 | Tokyo Electron Ltd. | Expedius | Batch Wafer Processing |
| 314 | Tokyo Electron Ltd. | Expedius | Batch Wafer Processing |
| 315 | Tokyo Electron Ltd. | Expedius+ | Batch Wafer Processing |
| 316 | Tokyo Electron Ltd. | NS 300Z | Wafer Scrubber |
| 317 | Tokyo Electron Ltd. | Tactras RLSA Poly | Polysilicon Etch |
| 318 | Tokyo Electron Ltd. | Tactras Vigus | Dielectric Etch |
| 319 | Tokyo Electron Ltd. | Tactras Vigus | Dielectric Etch |
| 320 | Tokyo Electron Ltd. | Tactras Vigus RK3 – Chamber Only | Dielectric Etch |
| 321 | Tokyo Electron Ltd. | TELFORMULA | Vertical Diffusion Furnace |
| 322 | Tokyo Electron Ltd. | TELFORMULA | Vertical Diffusion Furnace |
| 323 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 324 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 325 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 326 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 327 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 328 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 329 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 330 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 331 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 332 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 333 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 334 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 335 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 336 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 337 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 338 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 339 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 340 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 341 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 342 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 343 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 344 | Tokyo Electron Ltd. | TELFORMULA ALD High-K | Vertical LPCVD Furnace |
| 345 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 346 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 347 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 348 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 349 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 350 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 351 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 352 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 353 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 354 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 355 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 356 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 357 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 358 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 359 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 360 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 361 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 362 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 363 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 364 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 365 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 366 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 367 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 368 | Tokyo Electron Ltd. | TELFORMULA Nitride | Vertical LPCVD Furnace |
| 369 | Tokyo Electron Ltd. | TELINDY IRAD ALD Oxide | Vertical LPCVD Furnace |
| 370 | Tokyo Electron Ltd. | TELINDY IRAD ALD Oxide | Vertical LPCVD Furnace |
| 371 | Tokyo Electron Ltd. | TELINDY Oxide | Vertical LPCVD Furnace |
| 372 | Tokyo Electron Ltd. | TELINDY Oxide | Vertical LPCVD Furnace |
| 373 | Tokyo Electron Ltd. | TELINDY Plus ALD High-K | Vertical Furnace – Other |
| 374 | Tokyo Electron Ltd. | TELINDY Plus ALD High-K | Vertical Furnace – Other |
| 375 | Tokyo Electron Ltd. | TELINDY Plus ALD High-K | Vertical Furnace – Other |
| 376 | Tokyo Electron Ltd. | TELINDY Plus ALD High-K | Vertical Furnace – Other |
| 377 | Tokyo Electron Ltd. | TELINDY Plus ALD High-K | Vertical Furnace – Other |
| 378 | Tokyo Electron Ltd. | TELINDY Plus ALD High-K | Vertical Furnace – Other |
| 379 | Tokyo Electron Ltd. | TELINDY Plus ALD High-K | Vertical Furnace – Other |
| 380 | Tokyo Electron Ltd. | TELINDY Plus ALD High-K | Vertical Furnace – Other |
| 381 | Tokyo Electron Ltd. | TELINDY Plus IRAD Oxide | Vertical LPCVD Furnace |
| 382 | Tokyo Electron Ltd. | TELINDY Plus Nitride | Vertical LPCVD Furnace |
| 383 | Tokyo Electron Ltd. | TELINDY Plus Oxide | Vertical LPCVD Furnace |
| 384 | Tokyo Electron Ltd. | TELINDY Plus Oxide | Vertical LPCVD Furnace |
| 385 | Tokyo Electron Ltd. | TELINDY-B | Vertical Anneal Furnace |
| 386 | Tokyo Electron Ltd. | Telius 305 DRM | Dielectric Etch |
| 387 | Tokyo Electron Ltd. | Telius 305 DRM | Dielectric Etch |
| 388 | Tokyo Electron Ltd. | Telius 305 SCCM | Dielectric Etch |
| 389 | Tokyo Electron Ltd. | Telius SP-305 SCCM | Dielectric Etch |
| 390 | Tokyo Electron Ltd. | Trias Chamber | Parts/Peripherals |
| 391 | Tokyo Electron Ltd. | Trias Chamber | Parts/Peripherals |
| 392 | Tokyo Electron Ltd. | Trias Chamber | Parts/Peripherals |
| 393 | Tokyo Electron Ltd. | Trias Chamber | Parts/Peripherals |
| 394 | Tokyo Electron Ltd. | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 395 | Tokyo Electron Ltd. | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 396 | Tokyo Electron Ltd. | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 397 | Tokyo Electron Ltd. | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 398 | Tokyo Electron Ltd. | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 399 | Tokyo Electron Ltd. | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 400 | Tokyo Electron Ltd. | Trias Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 401 | Tokyo Electron Ltd. | Trias Ti/TiN Chamber | Parts/Peripherals |
| 402 | Tokyo Electron Ltd. | Trias Ti/TiN Chamber | Parts/Peripherals |
| 403 | Tokyo Electron Ltd. | Trias Ti/TiN Chamber | Parts/Peripherals |
| 404 | Tokyo Electron Ltd. | Trias W | MOCVD |
| 405 | Tokyo Electron Ltd. | Trias W | MOCVD |
| 406 | Tokyo Electron Ltd. | Trias W – Chamber Only | Metal CVD (Chemical Vapor Deposition) |
| 407 | Tokyo Electron Ltd. | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) |
| 408 | Tokyo Electron Ltd. | Triase+ SPA | Metal CVD (Chemical Vapor Deposition) |
| 409 | Tokyo Electron Ltd. | Triase+ Ti/TiN | Metal CVD (Chemical Vapor Deposition) |
| 410 | Tokyo Electron Ltd. | UW300Z | Batch Wafer Processing |
| 411 | Tokyo Electron Ltd. (TEL) | P-12XLn | Production Wafer Prober |
| 412 | Ulvac Corporation | Entron-EX | PVD (Physical Vapor Deposition) |
| 413 | Ulvac Corporation | Entron-EX | PVD (Physical Vapor Deposition) |
| 414 | Ulvac Corporation | Entron-EX | PVD (Physical Vapor Deposition) |
| 415 | Ulvac Corporation | Entron-EX | PVD (Physical Vapor Deposition) |
| 416 | Varian Semiconductor Equipment Associates | VIISta 3000XP | High Energy Implanter |
| 417 | Varian Semiconductor Equipment Associates | VIISta PLAD | High Dose Implant |
| 418 | Veeco Instruments Inc. | Dimension Vx 340 | Atomic Force Profiler (AFP) |
| 419 | Veeco Instruments Inc. | Dimension X1D | Atomic Force Microscope (AFM) |
| 420 | Veeco Instruments Inc. | Dimension X1D | Atomic Force Microscope (AFM) |
| 421 | Verigy (Agilent) | V4400 | Memory Tester |
| 422 | Verigy (Agilent) | V4400 | Memory Tester |
ID-SS5319-0-5