Description
Please contact us for the availability of the CPA V2000 used semiconductor equipment.
Five Target RF and DC Magnetron In Line Sputtering System. Currently configured for single sided sputtering but cathodes can be moved manually if double sided sputtering is desired. Target Size: 3-1/2 in. x 18 in. Easy access to cathodes via hinged doors. Currently configured with 4 DC and 1 RF cathodes. Multiple CTI cryopumps for high vacuum. Load lock chambers on both ends. Loader handles up to 28 20 in. H panels or pallets. Variable speed pallet transport system
The items are subject to prior sale without notice. These items are only for end users.
SS5626