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Chemical Vapor Infiltration (CVI) Systems

Description

Please contact us for the availability of the following used Chemical Vapor Infiltration (CVI) Systems semiconductor equipment 

Info from OEM for your reference only.

Chemical vapor infiltration (CVI) is a chemical vapor deposition (CVD) process that is performed at low pressures to allow for coating the internal surfaces of a porous material. Using heat and low pressure, precursor vapors penetrate the pores / fibers of the material and deposit to form a conformal coating on the internal surfaces.

The CVI platform is used to coat the internal surfaces of porous materials having complex shapes and geometries. Multiple systems are in production for coating biocompatible porous material used in medical implants and aerospace components.

The item is only for end user. The item is subject to prior sale without notice.

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