Centrotherm Photovoltaics oxidation

Description

Centrotherm Photovoltaics diffusion oxidation furnace

Condition: New, with 2 oxidation tubes . STILL IN ORIGINAL CRATES

Valid Term: These are  subject to prior sale. These are only for end user. Appreciate your time.

Location: CA, USA-SS7270W

Info for your reference. Contact us for the detail info from the original purchase specifications.

General
• The system modules are:

  • Wafer loading area
  • Scavenger
  • Tube furnace
  • Gas system
  • Vacuum system

• The system is designed for wafer sizes up to 156mm x 156mm.
• Loading system: Softlanding
• If sub-systems (e.g. quartz ware, gas/vacuum system) are supplied by the customer, the process specifications have to be fixed in a separate agreement.

System configuration

c.LAB 3.000-300-4(2)

Stack 4 (top):Empty
Stack 3:

  • Process: Dry Oxidation
  • Heater temperature: 600 – 1200°c
  • Process temperature: 100 – 1000°c
  • Process tube: quartz
  • Loading system: centrotherm Softlanding (SiC)
  • Tube closure type: closed tube system

Stack 2:

  • Process: Dry Oxidation
  • Heater temperature: 600 – 1200°c
  • Process temperature: 100 – 1000°c
  • Process tube: quartz
  • Loading system: centrotherm Softlanding (SiC)
  • Tube closure type: closed tube system

Stack 1: Empty

System Dimensions:

  • L 1: 3000 mm
  • L2: 350 mm
  • L4: 2000 mm
  • LS: 1200 mm
  • W1 : 650 mm
  • W2: 1225 mm
  • W3: 145 mm
  • W4: 800 mm
  • W5: 1400 mm
  • H1: 2680 mm
  • H2: 320 mm
  • H4: 2650 mm

1 Furnace
• The furnace subsystems are: • Heating elements; • Temperature measurement system; • Furnace control system ;• Furnace cooling system; • Security system
1.1 Heating elements
• Temperature flat uniformity : • 350-600°C: ±3,0°C; • 600-1000°C: ±1,0°C
• Heating elements and configuration in centrotherm design : • Excellent temperature uniformity; • Excellent temperature stability; • Extended lifetime; • Adapted to the required dynamic properties (ramp rates, max. temperature) for optimized energy consumption
1.2 Temperature measurement
• Thermocouples
• for type and accuracy see section “Technical system configuration”.  2 Spike thermocouples in each heating zone Temperature control directly connected (no compensation wiring) to DeviceNet measurement amplifier. Over-temperature protection. 1 profiling thermocouple in each heating zone (if cascade control is installed)
• Device-Net Therr:nocouple amplifier. Electronic cold junction reference (Pt 100);  No analog signals

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The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers