Description
CEE100 wafer spin coater dual dispense nozzles, 200mm wafer chuck, and base cabinet
- Programmer 10 programs of up to 10 steps each
- Custom base cabinet with pull out photoresist cannister tray
- Max 200mm substrate
- 0-6000rpm range
- 2 dispense nozzles and 1 N2 blowoff nozzle
Please contact us if you are interested in the item. This item is only for end users and are subject to sale without notice. Appreciate your time.
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