Cambridge Nanotech F200 Atomic layer deposition system with load lock

MANUFACTURER: Cambridge Nanotech

MODEL: Fiji F200

Description:

• Atomic layer deposition system with load lock
• Any substrate up to 200 mm wafer
• Plasma enhanced ALD available with O2, Ar, and N2 gases
• Thermal ALD with temperatures up to 300°C
• Turbo pump with APC