Description
Materials Research Corp MRC 903 Sputtering Deposition System. The Unique high throughput loadlock features a dual-level elevator, radiant heater for out-gassing and it’s own 1,500 I/sec. cryopump for rapid pumpdown, while a second pallet continues simultaneously uninterrupted.The high vacuum pumping of the loadlock maintains very low partial pressures of contamination gases and ensures excellent film quality.The standard MRC 943 configuration includes computer control and an interactive keyboard and CRT display system. This allows for easy entry of process parameters and pallet scan mode. All ancillary components, such as DC power supply, mechanical pump and both cryopump compressors, are located behind the system up to 10 feet away. The MRC 943 is a batch sputtering system designed for process flexibility usually found only in R&D systems. The MRC provides 3 targets in-line with bi-directional and multi-pass scanning, allowing the deposition of superior quality films in a wide range of modes.
Valid time: Subject to prior sale without notice.
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ID-SS1184