Description
Cambridge Nanotech Model fiji F200:
- Atomic layer deposition system with load lock
- Any substrate up to 200 mm wafer
- Plasma enhanced ALD available with O2, Ar, and N2 gases
- Thermal ALD with temperatures up to 300°C
- Turbo pump with APC
Condition: Unit pulled from a working service, however due to lack of power supply unable to fully test. Sold As-Is. Complete,working,functional test or refurbished conditions are optional at extra cost.
Valid time: Subject to prior sale without notice. Appreciate your time.
ID-SS380-e
