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TRION Phantom II ICP System Plasma Etch System

TRION Phantom II ICP System Plasma Etch System

Description

The items are subject to prior sale without notice. These items are only for end users.

TRION Phantom II ICP System Plasma Etch System

Windows 2000
Chamber, 8″
Gases: SF6, He, CHF3, CF4

Power supplies: 230 V, 50/60 Hz, 1 Phase
2000 vintage.

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