Description
Please contact us if you are interested in the following Lithography Equipment. The Lithography Equipment are only for end users and are subject to prior sale without notice. Appreciate your time.
Equip Code | Name | Type |
5 | 300mm hotplate | Resist Processing |
6 | 300mm spinner | Resist Processing |
7 | 3C Technical GCA AutoStep 200 5x Reduction Stepper | UV |
47 | AB-M Contact Aligner | UV |
49 | ABM 3000 | UV |
50 | ABM Contact Aligner | UV |
51 | ABM Contact Aligner | UV |
158 | ARRAY1 | Soft Lithography |
159 | AS200 i-line Stepper | UV |
164 | ASML 300C DUV Stepper | DUV |
165 | ASML PAS 5500/60 i-line Stepper | UV |
194 | Automated Coater/Developer | Resist Processing |
197 | Autostep i-line Stepper | UV |
203 | Bachur and Associates UV Flood Exposure System | Resist Processing |
216 | BATH 5 | Resist Processing |
217 | BATH 6 | Resist Processing |
241 | BLE Spinner | Resist Processing |
249 | Brewer Cee 100CB | Resist Processing |
250 | Brewer CEE Spinner | Resist Processing |
251 | Brewer CEE Spinner and Hotplate | Resist Processing |
252 | Brewer Science Spinner | Resist Processing |
288 | Canon I-line stepper | UV |
289 | Canon Stepper | UV |
302 | CEE-100 Spinner | Resist Processing |
328 | COATHOOD1 | Resist Processing |
329 | COATHOOD2 | Resist Processing |
340 | Contact Aligner System | UV |
341 | Contact Aligner System | UV |
342 | Contact Aligner System – Backside Aligning | UV |
349 | Convection Ovens | Resist Processing |
358 | CPK Spin Developer/Etch Bench | Resist Processing |
410 | Dehydration Oven | Resist Processing |
431 | Develop Bench | Resist Processing |
434 | DEVHOOD1 | Resist Processing |
485 | DWL66 Laser Wrier | Other |
494 | E-beam Litho | EBL |
495 | E-Beam Lithography Hot Plates | Resist Processing |
496 | E-beam Lithography Spinners | Resist Processing |
497 | E-Beam Resist Hot Plate Tower | Resist Processing |
500 | e-beam: JEOL 6300-FS | EBL |
504 | Ebeam Resist Hood – Left | Resist Processing |
505 | Ebeam Resist Hood – Right | Resist Processing |
507 | EBL | EBL |
509 | EBL1 | EBL |
510 | ECE418 Aligner | UV |
530 | Electron Beam Lithography Spinner | Resist Processing |
531 | Electron Beam Lithography Spinner | Resist Processing |
532 | Electron Beam Resist Developing Station | Resist Processing |
533 | Electron Beam Resist Oven | Resist Processing |
534 | Electron Beam Resist Spin Coating Station | Resist Processing |
544 | Elionix ELS-7000 | EBL |
545 | Elionix ELS-7500EX | EBL |
546 | Elionix ELS-F125 | EBL |
559 | EMS Hotplate | Resist Processing |
568 | EV Group 620 Contact Aligner | UV |
569 | EV Group 620 Contact Aligner | UV |
570 | EV Group Contact Aligner | UV |
581 | EVG 150 Automated Wafer Coater/Developer | Resist Processing |
584 | EVG 620 Mask Aligner | UV |
585 | EVG 620 Mask Aligner | UV |
588 | EVG Contact Aligner | UV |
589 | EVG520 wafer bonding/hot embossing | Other |
590 | EVG620 Lithography System | UV |
686 | Gamma Automatic Coat-Develop Tool | Resist Processing |
696 | GCA 5x Stepper | UV |
697 | GCA 8500 Stepper | UV |
733 | Headway Spin Coater | Resist Processing |
734 | Headway Spinner hood J21/J23 | Resist Processing |
738 | Heidelberg Laser Writer | Mask Making |
739 | Heidelberg laserwriter | Mask Making |
740 | Heidelberg Mask Writer | Mask Making |
741 | Heidelberg Mask Writer – DWL2000 | Mask Making |
742 | Heidelberg Mask Writer – DWL66 | Mask Making |
743 | Heidelberg MLA150 | UV |
744 | Heidelberg MLA150 Direct Write Lithographer | Mask Making |
745 | Heidelberg uPG501 | UV |
746 | Heidelberg µP-101 Direct Write Lithography | Mask Making |
784 | HMDS oven | Resist Processing |
797 | Hotplates and Ovens | Resist Processing |
829 | Image Reversal Oven | Resist Processing |
877 | JBA 1000 DUV Resist Cure Lamp | Resist Processing |
886 | JEOL 6300 | EBL |
888 | JEOL 9500 | EBL |
891 | JEOL e-beam lithography | EBL |
892 | JEOL Electron Beam Lithography | EBL |
893 | JEOL JBX-9300FS EBL System | EBL |
895 | JEOL JSM-7000F | EBL |
909 | Karl Suss Gyrset RC-8a | Resist Processing |
910 | Karl Suss Gyrset RC-8b | Resist Processing |
911 | Karl Suss MA 6 Mask Aligner | UV |
912 | Karl Suss MA-6 Contact Aligner 1&2 | UV |
913 | Karl Suss MA-6 Mask Aligner – Inorganic | UV |
914 | Karl Suss MA-6 Mask Aligner – Pettit | UV |
915 | Karl Suss MA6 — Instructional Center | UV |
916 | Karl Suss MA6 Mask Aligner | UV |
917 | Karl Suss MJB-3 Aligners | UV |
918 | Karl Suss MJB3 Mask Aligner | UV |
919 | Karl Suss MJB3 Mask Aligner | UV |
921 | Karl Suss RC8 Spinner (Marcus) | Resist Processing |
922 | Karl Suss RC8 Spinner (Pettit) | Resist Processing |
925 | Karl Suss TSA MA-6 Mask Aligner | UV |
955 | LabSpin8 Spin Coater | Resist Processing |
976 | Layout BEAMER/LAB software | Other |
1054 | Mask Aligner | UV |
1055 | Mask Aligner | UV |
1056 | Mask Aligner | UV |
1057 | Mask Aligner | UV |
1058 | Mask Aligner | UV |
1059 | Mask Aligner | UV |
1060 | Mask Writer 1 | Mask Making |
1061 | Mask Writer 2 | Mask Making |
1062 | Maskless Aligner | Mask Making |
1085 | Metal Lift-Off Processing Station | Resist Processing |
1105 | Microfluidics/PDMS processing setup | Soft Lithography |
1129 | Microtech Laserwriter LW405 | Mask Making |
1144 | MJB4 Mask Aligner | UV |
1145 | MLA150 Maskless Aligner | UV |
1183 | Nabity | EBL |
1205 | Nanoscribe 3D Lithography System | Other |
1213 | Negative Resist Hot Plate Tower | Resist Processing |
1214 | Negative Resist Oven | Resist Processing |
1215 | Negative Resist Spinner | Resist Processing |
1216 | Negative Resist Spinner | Resist Processing |
1234 | OAI 808 Aligner | UV |
1235 | OAI 8808 Mask Aligner w/DUV | UV |
1236 | OAI Mask Aligner | UV |
1302 | PAMS_JEOL_Pre-Alignment | Other |
1316 | PDMS Casting Station (PDMS station) | Soft Lithography |
1317 | PDMS Process Bench | Soft Lithography |
1318 | PDMS Processing Clean Space | Soft Lithography |
1347 | Photo Resist Dispensing System | Resist Processing |
1348 | Photo Resist Exposing System | Resist Processing |
1349 | PHOTO1 | UV |
1350 | PHOTO2 | UV |
1352 | Photolithography Hotplates (Rm 121) | Resist Processing |
1353 | Photolithography Spinners (Rm 121) | Resist Processing |
1354 | Photolithography Spinners (SU8 etc) | Resist Processing |
1355 | Photolithography Wet Benches (Rm 121) | Resist Processing |
1356 | Photolithography Wet Benches (Rm 133) | Resist Processing |
1357 | Photolithography Wet Benches (SU8 etc) | Resist Processing |
1358 | Photomask Aligner | UV |
1359 | Photomask Laser Pattern Generator | Mask Making |
1360 | Photoresist Developer Station | Resist Processing |
1364 | PI-Oven | Resist Processing |
1421 | Positive Resist Hot Plate Tower | Resist Processing |
1422 | Positive Resist Oven | Resist Processing |
1423 | Positive Resist Spinner | Resist Processing |
1424 | Positive Resist Spinner | Resist Processing |
1425 | Positive/Negative Photoresist Station | Resist Processing |
1488 | Raith 150 Electron Beam Lithography System | EBL |
1490 | Raith E-line | EBL |
1491 | Raith EBPG5000 Plus E-Beam Writer | EBL |
1492 | Raith Pattern generator | EBL |
1493 | Raith-150 E-Beam | EBL |
1494 | Raith50 E-beam Writer | EBL |
1526 | Resist Hot Strip Bath | Resist Processing |
1530 | Reynolds Tech E-Beam Resist Spin & Develop Bench | Resist Processing |
1531 | Reynolds Tech Negative Photoresist Develop Bench | Resist Processing |
1532 | Reynolds Tech Negative Photoresist Spinner Bench | Resist Processing |
1533 | Reynolds Tech Positive Photoresist Develop Bench | Resist Processing |
1534 | Reynolds Tech Positive Photoresist Spinner Bench | Resist Processing |
1613 | SCS G3P8 -Soft-lithography | Soft Lithography |
1620 | SCS Spin Coater | Resist Processing |
1634 | Semiautomatic Screen Printer | Other |
1641 | SF-100 Auto Stage | Other |
1642 | SFIL IMPRIO100 | Other |
1668 | Soft Lithography Hot Plate Tower | Resist Processing |
1672 | Solvent Based Photoresist Developer Station | Resist Processing |
1679 | Solvent/Headway Spinner Bench | Resist Processing |
1709 | Spincoater | Resist Processing |
1710 | Spinner | Resist Processing |
1711 | Spinner | Resist Processing |
1712 | Spinner Bench | Resist Processing |
1720 | Spray developer | Resist Processing |
1777 | SU-8 and PDMS Baking | Resist Processing |
1778 | SU-8 Hotplates | Resist Processing |
1779 | SU-8 Spin Coating Station | Resist Processing |
1780 | SU-8/PDMS Resist Spinner | Resist Processing |
1781 | SU-8/PDMS Spin Bench | Soft Lithography |
1782 | SUEX / ADEX Laminator | Resist Processing |
1789 | SUSS MA6 Mask Aligner | UV |
1790 | Suss MA6-BA6 Contact Aligner | UV |
1791 | Suss MicroTec AltaSpray Automated Spray Coated AS8 | Resist Processing |
1792 | SUSS MicroTec MA-6 | UV |
1793 | Suss Microtec MA6/BA6 Contact Aligner | UV |
1794 | Suss Microtec MJB4 | UV |
1795 | Suss Microtec MJB4 | UV |
1796 | Suss MJB4 Contact Aligner | UV |
1797 | SUSS MJB4 Manual Mask Aligner | UV |
1798 | Suss MJB4 Mask Aligner | UV |
1903 | Tractrix Spinbot | Resist Processing |
1954 | Ultraviolet Flood Exposure System | Resist Processing |
1973 | Vacuum Oven | Resist Processing |
1974 | Vapor Prime Oven | Resist Processing |
2005 | Vistec EBPG | EBL |
2006 | Vistec EBPG5000+ | EBL |
2013 | WAFAB Developer Bench | Resist Processing |
2039 | Wet Bench – Resist | Resist Processing |
2102 | YES III Vapor Prime Oven | Other |
2103 | YES Image Reversal Oven | Resist Processing |
2104 | YES Image Reversal Oven | Other |
2105 | YES Polyimide Bake Oven | Resist Processing |
2107 | YES Vapor Phase Deposition System | Resist Processing |
2108 | YES Vapor Prime Oven | EBL |
2109 | YES Vapor Prime Oven | Resist Processing |
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