Plasma Asher Descum Etch RIE ICP Ion Mill release Semiconductor Process Equipment

Description

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The following equipment are the most popular production proven Plasma Asher /Descum /Etch /RIE /ICP /Ion Mill /release Semiconductor Process Equipment in USA Fabs/Labs.

1. Plasmatherm Versaline DSEIII ICP SF6, C4F8, O2, Ar Deep silicon etch, Deep Ge etch, SOI 100mm
2. Advanced Vacuum 320 RIE CF4, CHF3, SF6, Ar,N2, CH3OH silicon, silicon based,dielectrics, magnetic materials up to 200mm
3. Advanced Vacuum Vision 300MK2 RIE CF4, CHF3, SF6, O2,Ar silicon,silicon based,dielectrics up to 300mm
4. Advanced Vacuum Vision 300MKII RIE CF4, CHF3, SF6, O2,Ar,N2 silicon,silicon based,dielectrics up to 300mm
5. AJA Ion Mill Argon many materials up to 150mm
6. Alcatel ICP SF6, C4F8, Ar, O2 Si deep etch 100mm
7. Alcatel AMS100 ICP SF6, C4F8, CF4, O2 Si deep etch up to 150mm
8. Alcatel,AMS100 ICP SF6, C4F8, CH4, Ar,He, O2 Si deep etch,Si dielectrics,quartz,Ti, Ta, W up to 150mm
9. Allwin21 AW-1008 Asher O2,N2 Asher up to 150mm
10. AMAT 8100 Hex RIE CHF3, SF6, NF3, Ar,O2 silicon,based dielectrics 100mm
11. Allwin21 AW-1008 Asher O2,N2 Asher up to 150mm
12. AMAT P5000 (3 chambers) MRIE Cl2, BCl3, CF4, Ar,N2/ CHF3, CF4, Ar, He,O2,N2/ Cl2, HBr, NF3, CF4,SF6, He/O2 aluminum,silicon/ silicon,based dielectrics/ silicon,poly silicon 100mm
13. Allwin21 AW-903eR Etcher SF6, CHF3,N2,He Plasma Etch,SiO2 up to 150mm
14. Anatech Asher O2 PR strip,Bosch polymer removal up to 150mm
15. Anatech 1 Asher O2 PR strip up to 150mm
16. Anatech 1 Asher CF4, O2, Ar, N2 PR strip, barrel up to 150mm
17. Allwin21 AW-105R Asher O2,N2 Asher,Descum,Clean up to 150mm
18. Anatech 2 Asher O2 PR strip up to 150mm
19. Anatech 2 Asher O2 PR strip, activation,barrel up to 200mm
20. Allwin21 AW-901eR Etcher SF6,CFCL3,Ar,O2 Plasma Etch,Polysilicon, SixNx up to 150mm
21. Aura 1000 Asher O2 PR strip up to 150mm
22. AutoGlow Asher O2, N2 PR strip varied
23. Allwin21 AW-2001R Etcher NF3 CF4 HE O2 Plasma Etch,Polysilicon, SixNx,SiO2 Up to 150mm
24. Allwin21 AW-B3000 Asher O2,N2 Asher,Descum,Clean up to 200mm
25. Barrel Etch Asher O2, N2 PR strip varied
26. Branson/IPCAsherO2PR strip
27. Cleaner Asher O2, N2 PR strip varied
28. Drytek-100 RIE CF4, SF6, CHClF2, O2 Si, Si dielectrics,W, Ti up to 150mm
29. Femto Plasma Asher O2, N2 PR strip varied
30. Allwin21 AW-903eR Etcher SF6, CHF3,N2,He Plasma Etch,SiO2 up to 150mm
31. Gasonics AE 2001 Etcher NF3 CF4 HE O2 Plasma Etch,Polysilicon, SixNx,SiO2 Up to 150mm
32. Gasonics Aura 1000 Asher O2 PR strip 100mm
33. Gasonics Aura 1000 Asher O2 PR strip up to 150mm
34. Gatan Solarus Asher O2, N2 PR strip varied
35. Glenn 1000 Asher O2 PR strip up to 200mm
36. Intlvac IBE Ar, O2 diamond, noble up to 150mm
37. Intlvac ion mill Ar varied materials Up to 100mm
38. Intlvac Nanoquest-I ion mill Ar, O2, N2 varied materials up to 100mm
39. Intlvac Nanoquest-I ion mill Ar, O2, N2 varied materials up to 100mm
40. Intlvac Nanoquest-II Ion Mill Ar-22cm various materials up to 150mm
41. Allwin21 AW-B3000 Asher O2,N2 Asher,Descum,Clean up to 200mm
42. Ion Wave 10 Asher O2 resist removal up to 200mm
43. Lam 9400 TCP HBr, Cl2, CF4, C2F6,O2, N2, H2 silicon, poly-silicon 100mm
44. LAM Exelan 2300 RIE C4F8, CF4, HBr, SF6,CHF3, CO, CO2, N2,H2, Ar, O2 polymers, BCPs 300mm
45. LFE Asher O2 descum/activate up to 100mm
46. Allwin21 AW-901eR Etcher SF6,CFCL3,Ar,O2 Plasma Etch,Polysilicon, SixNx up to 150mm
47. March 1703
48. March RIE CS 1701 RIE CHF3, CF4, H2, O2 SiO2, Si3N4, PR,Parylene, Polyimide up to 150mm
49. Matrix 105 Asher O2 PR strip 100mm
50. Matrix 106AsherO2PR strip
51. Memsstar Orbis Alpha release vapor HF silicon oxide up to 200mm
52. Oxford 100 ICP CF4, CHF3, C2F6, C4F8,C4F6, CH2F2, SF6, Ar,O2, N2, CO2,gas ring silicon based,dielectrics, SiO2, Si3N4, quartz, fused silica 100mm
53. Oxford 100 ICP HBr, Cl2, BCl3, SF6,SiCl4, CH4, H2, O2,N2, Ar III-V’s up to 100mm
54. Oxford 100 ICP Cl2, SiCL4, BCl3, SF6,Ar, O2, N2, H2 cryo Si etch, III-Vs up to 100mm
55. Oxford 100 ICP CHF3, C4F8, CF4, Ar,SF6, O2 Si, SiO2 up to 150mm
56. Oxford 100 RIE CHF3, CF4, SF6, O2,Ar, N2 Si, SiC,dielectrics 100mm
57. Oxford 100 Cobra ICP HBr, Cl2, CH3OH, O2,H2, SF6, Ar, BCl3 shallow silicon etch, magnetics etch,cryogenic Si etch, [F] based metal etch, diamond etch 100mm
58. Allwin21 AW-903eR Etcher SF6, CHF3,N2,He Plasma Etch,SiO2 up to 150mm
59. Oxford 100 Cobra ICP BCl3, Cl2, HBr, CH4, H2,SF6, O2, Ar, N2 III-V’s, II-VI’s 100mm
60. Oxford 100, 200C ICP-180 ICP Cl2, BCl3, SiCl4, SF6,CH4, H2, N2, O2, Ar silicon 100mm
61. Oxford 100, cryo-chuck, ICP-180 ICP SF6, C4F8, CHF3, N2O,SiH4, N2, Ar, O2 silicon,silicon based,dielectrics, Nb, W, metals, polymers 100mm
62. Allwin21 AW-B3000 Etcher CF4,Ar,O3 Plasma Etch,Polysilicon, SixNx,SiO2 up to 150mm
63. Oxford 100,cryo-chuck ICP-380 ICP SF6, C4F8, Ar, O2 deep silicon etch up to 150mm
64. Oxford 80 RIE CHF3, CF4, SF6, Ar,O2 Silicon,Si dielectrics up to 200mm
65. Oxford 80 RIE CF4, CHF3, SF6, O2,Ar Si, Si dielectrics,fused silica, quartz, up to 200mm
66. Oxford 80 RIE Cl2, CHF3, SF6, CH4,H2, N2, Ar Si, SiGe, III-V’s,polymers up to 200mm
67. Oxford 80 RIE Cl2, BCl3, CHF3, CF4,SF6, O2, Ar oxides, nitrides,metals,polymers up to 150mm
68. Oxford 80 Plasmalab Endpoint RIE CF4, CHF3, Ar, O2 silicon based, dielectrics Up to 100mm
69. Oxford 80+ Plasmalab 1 RIE CF4, CHF3, SF6, Ar, H2, O2 Si, SiO2, SiN, Ta, polymers Up to 200mm
70. Oxford 80+ Plasmalab 1 RIE CF4, CHF3, SF6, Ar, H2,O2 Si, SiO2, SiN, CMOS only up to 200mm
71. Oxford CobraICPSi cryo etch,metal etch,magnetics,polymers
72. Oxford Cobra ICP C4F8, Cl2, BCl3, SF6,O2, Ar Al203, Al, Cr up to 100mm
73. Oxford Cryogenic 100 ICP Cl2, BCl3, SF6, CHF3,CO2, C4F8, H2, Ar, H2,He Silicon,silicon based,dielectrics,metals 100mm
74. Allwin21 AW-901eR Etcher SF6,CFCL3,Ar,O2 Plasma Etch,Polysilicon, SixNx up to 150mm
75. Oxford Plasma Pro Estrelas ICP C4F8, CHF3, CF4,SF6, O2, Ar Si deep etch, cryo deep etch up to 100mm
76. Oxford PlasmaLab 100-180 ICP CF4, CHF3, SF6, Cl2,BCl3, Ar, N2, O2 SiN, SiO2, Al2O3, Al,HfO2, ZnO 100mm
77. Oxford PlasmaLab 80 RIE Cl2, BCl3, O2, N2, Ar, III-V’s, metals up to 200mm
78. Oxford PlasmaLab 80 RIE CF4, CHF3, SF6, O2,Ar silicon and silicon based,dielectrics up to 200mm
79. Allwin21 AW-B3000 Etcher CF4,Ar,O2 Plasma Etch,Polysilicon, SixNx,SiO2 up to 150mm
80. Oxford PlasmaLab 80 RIE CHF3, CF4, SF6, Ar, O2 silicon and silicon based,dielectrics up to 200mm
81. Plasma Etch 100 asher O2 resist removal,polymers, up to 200mm
82. Plasmatherm ICP HBr, Cl2, SF6, Ar, O2 Si, SiGe up to 150mm
83. PlasmathermICPCl2metals,  III-Vs
84. PlasmathermICPfluorine
85. Plasmatherm 72RIECF4, CHF3, SF6, H2,O2Si, SiO2, SiN, W, Ta, polymers
86. Plasmatherm 720 RIE Cl2, BCl3, O2, H2, Ar III-V’s, Al, Cr, Ti, Si up to 200mm
87. Plasmatherm 720/740 RIE Left: Cl2, BCl3, O2, CH4, N2,SF6, Ar; Right: Cl2, BCl3, O2,CF4, SF6,Ar Left: Au exposure; Right:2D materials,WSe2, NbSe2, GaSe Up to 200mm
88. Plasmatherm 770 SLR ICP C4F8, SF6, O2, Ar/ Cl2, BCl3, C4F8, CF4, H2, Ar, O2 deep silicon etch/III-V’s, SiO2, SiN,Al, other metals Up to 150mm/100mm
89. Allwin21 AW-B3000 Asher O2,N2 Asher,Descum,Clean up to 200mm
90. Plasmatherm 790 RIE Cl2, BCl3, O2,Ar/CHF3, CF4, SF6, O2, Ar III-V’s, silicon,Al, Cr, metals/ Si, SiO2, SiN, SU8,BCB, polyimide Up to 200mm/4-100mm
91. Plasmatherm 790 RIE BCl3, SiCl4, CF4, CH4,H2, SF6, O2 III-V’s 100mm
92. Plasmatherm 790 RIE Cl2, HBr, CF4, O2, He/CHF3, O2, H2, Ar silicon, polysilicon/silicon oxide up to 200mm
93. Plasmatherm SLR 770 ICP C4F8, SF6, O2, Ar deep silicon etch 100mm
94. Plasmatherm Versaline ICP Cl2, BCl3, SF6, CF4,CH4, O2, Ar, N2 metals up to 150mm
95. Plasmatherm Versaline ICP C4F8, CHF3, CF4, H2,Ar, O2, N2, He silicon,based dielectrics 100mm
96. Plasmatherm Versaline ICP SF6, C4F8, Ar, O2 Si deep etch 100mm
97. Allwin21 AW-903eR Etcher SF6, CHF3,N2,He Plasma Etch,SiO2 up to 150mm
98. Plasmatherm Versaline DSE ICP SF6, C4F8, O2, Ar deep silicon etch,SOI 100mm
99. Plasmatherm Versaline DSE ICP SF6, C4F8, O2, H2 deep silicon etch 100mm
100. Plasmatherm,Batchtop RIE Cl2, HBr, CF4, O2 Si, SiGe, high k dielectrics up to 150mm
101. PM-600 Asher O2 PR strip,Barrel up to 150mm
102. Primaxx uetch Release HF, MeOH, N2 Silicon oxide up to 200mm
103. PT 790 RIE F-based chemistry Si, Si dielectrics,Ru, Ni, Nb, polyimide,BARC up to 200mm
104. PT Apex SLR ICP up to 200mm
105. PT Versaline ICP BCl3, Cl2, HBr, CH4,O2,Ar diamond 100mm
106. Ptherm 770 (Two Chambers) ICP Left: Cl2, BCl3, SF6, O2, N2, Right: Cl2, BCl3, O2, H2, Ar, SiCl4, SF6
107. CH4 metal etch,III-Vs, III-Nitrides 100mm/100mm
108. PVA Tepla Ion Wave 10AsherO2, Arbarrel resist removal
109. SamcoAsherUV /O3PR strip
110. Allwin21 AW-B3000 Etcher CF4,Ar,O5 Plasma Etch,Polysilicon, SixNx,SiO2 up to 150mm
111. Samco 10NR RIE RIE CF4, CHF3, SF6, O2,Ar, N2 Si, Si dielectrics up to 200mm
112. Allwin21 AW-901eR Etcher SF6,CFCL3,Ar,O2 Plasma Etch,Polysilicon, SixNx up to 150mm
113. Semigroup RIE CHF3, SF6, Ar, O2 Si dielectrics up to 150mm
114. South Bay RIE SF6, CHF3, CF4, Ar,O2 silicon, ,silicon based, dielectrics up to 150mm
115. SPTS microetch Vapor HF HF, EtOH, N2 SiO2 200mm
116. SPTS Pegasus ICP SF6, C4F8, Ar, O2 Si deep etch up to 150mm
117. SPTS Primaxx uEtch VHF release VHF silicon dioxide up to 200mm
118. SPTS Xactix e2 XeF2 release XeF2 silicon up to 150mm
119. STPS Rapier ICP C4F8, SF6, Ar, O2 Si deep etch,Ge deep etch 100mm
120. STPS Rapier ICP SF6, C4F8, Ar, O2 Deep Si etch up to200mm
121. STS ICP Cl2, BCl3, O2, Ar, CH4, III-V’s and silicon 100mm
122. STS ICP HBr, Cl2, CF4, O2,Ar Si, SiGe, high k up to 200mm
123. STS 320 RIE CF4, CHF3, SF6, Ar,O2 silicon and silicon,based dielectrics up to 200mm
124. STS ASE ICP C4F8, SF6, O2, Ar deep silicon etch,SOI 100mm
125. Allwin21 AW-B3000 Etcher CF4,Ar,O4 Plasma Etch,Polysilicon, SixNx,SiO2 up to 150mm
126. STS ASE ICP SF6, C4F8, Ar, O2 Si deep etch 100mm
127. STS ASE ICP C4F8, SF6, Ar, O2 Deep silicon etch 100mm
128. STS HRM ICP C4F8, SF6, O2, Ar,CO2 deep silicon etch, SOI 150mm
129. STS Multiplex Pro ASE ICP SF6, C4F8, O2 deep silicon etch, SOI 100mm
130. STS Pegasus ICP C4F8, SF6, O2, Ar deep silicon etch 150mm
131. STS Pegasus ICP ICP SF6, C4F8, Ar, O2 Si deep etch 100mm
132. STS Rapier ICP SF6, C4F8, O2, Ar,N2 deep silicon etch up to 150mm
133. STS-AOE ICP C4F8, SF6, O2, H2,CF4 SiO2, quartz, pyrex,fused silica, Si, SiN 150mm
134. Allwin21 AW-1008 Asher O2,N2 Asher up to 150mm
135. STS-LPX ICP SF6, C4F8, CHF3, O2,Ar, Cl, HBr, CF4, BCl3,H2 Si, Si dielectrics,BN, SiC, graphene up to 150mm
136. STS-SOE ICP Cl2, BCl3, HBr, CHF3,CH4, H2, CF4, Ar, O2,N2 shallow silicon,III-V’s 100mm
137. TechnicsAsherO2PR strip
138. Technics RIE SF6, O2 varied materials, up to 200mm
139. Technics Micro RIE Asher O2, N2 descum/activate up to 100mm
140. Tegal 411AsherO2PR strip
141. Tegal 412AsherO2PR strip
142. Tegal 512Etcher
143. Tegal 901 Etcher SF6,CFCL3,Ar,O2 Plasma Etch,Polysilicon, SixNx Up to 150mm
144. Tegal 903e Etcher SF6, CHF3,N2,He Plasma Etch,SiO2 Up to 150
145. Tepla 100 asher O2 resists, polymers up to 100mm
146. Trion ICP SF6, Cl2, BCl3, CF4,CH4, O2, H2, He III-Vs, oxides,polymers,metals up to 150mm
147. Allwin21 AW-105R Asher O2,N2 Asher,Descum,Clean up to 150mm
148. Trion ICP CF4, SF6, CHF3, HBr,Cl2, BCl3, SiCl4, O2 III-Vs, Al2O3,Si dielectrics up to 200mm
149. Trion Minilock II ICP BCl3, Cl2, HBr, SiCl4,CH4, H2, CF4, O2, Ar III-Vs up to 125mm
150. Trion Minilock III ICP Cl2, BCl3, O2, Ar, CHF3,N2 chrome etch 100mm/150mm/200mm
151. Trion Minilock III ICP BCl3, Cl2, CF4, H2,O2 Si, Si dielectrics,GaAs, Al up to 200mm
152. Trion Minilock Phantom III ICP BCl3, Cl2, CF4, SF6,Ar, O2 Metals, Si,polymers up to 300mm
153. Trion Minilock Phantom III ICP BCl3, Cl2, CHF3, CF4,SF6, O2, Ar Si, SiO2, GaAs, GaN,Ti, Al, Au, Pt, Cr up to 200mm
154. Allwin21 AW-105R Asher O2,N2 Asher,Descum,Clean up to 150mm
155. Trion Oracle ICP CF4, SF6, CHF3, O2, Ar,N2, He/ SO2, CO2, C2H6, Ar,N2, He, O2/Cl2, CF4, He quartz/imprint/chrome up to 200mm
156. Trion Phantom II ICP CHF3, CF4, SF6, O2 Si dielectrics,polymers up to 200mm
157. Trion Phantom II RIE SF6, CHF3, O2 silicon,silicon based,dielectrics up to 200mm
158. Ulvac-570NLDSF6, CF4, CHF3, C4F8,O2, Ar, Cl2Si dielectrics, TiO2,LiNbO3, Al2O3
159. Unaxis RIE Cl2, O2, Ar, BCl3 shallow silicon 3-100mm
160. Allwin21 AW-B3000 Asher O2,N2 Asher,Descum,Clean up to 200mm
161. Unaxis 770 ICP SF6, C4F8, O2, Ar Deep silicon etch,Mixed silicon etch, Release 100mm/150mm
162. Unaxis 770 ICP HBr, Cl2, BCl3, CH4,H2, Ar, O2, N2 III-V’s , 200C , diamond up to 150mm
163. Veeco Microetch ion mill Argon many materials up to 150mm
164. Vision 320 RIE CF4, SF6, Ar,N2,O2,H2 Silicon,silicon based,dielectrics Up to 200mm
165. Xactix release XeF2, N2 release, Si etch up to 100mm
166. Xactix release XeF2 release, Si etch up to 100mm
167. Allwin21 AW-105R Asher O2,N2 Asher,Descum,Clean up to 150mm
168. Xactix XeF2 XeF2, N2 Si, Ge, SiGe 150mm
169. Xactix E1 XeF2 XeF2 Si Up to 100mm
170. Xactix E1 XeF2 XeF2, N2 silicon up to 150mm
171. Xactix E-1 XeF2 XeF2, N2 silicon up to 200mm
172. Xactix E2 Release XeF2 release up to 150mm
173. Xactix XeF2 release XeF2 Si isotropic up to 150mm
174. Xactix-XetchX3 Release XeF2, N2 Silicon up to 150mm
175. YES Asher O2 PR strip up to 200mm
176. YES CV200 Asher O2 resist removal up to 200mm
177. Yes CV200RFS Asher O2 PR strip up to 200mm
178. YES G1000 asher O2 multi-mode ashing Up to 150
179. Allwin21 AW-1008 Asher O2,N2 Asher up to 150mm

ss380NNCI-Etch

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