Description
Please contact us for the availability of the following used Metal Organic CVD System (MOCVD System) semiconductor equipment
Info from OEM for your reference only.
The MOCVD systems have the capability of depositing layers of desired composition on a suitable substrate with graded composition (achieved by programming the software to ramp the appropriate flows). Exact process control produces MOCVD layers with abrupt interfaces or individual layers having a graded composition.
The MOCVD systems are designed to meet your production requirements with flexibility and low operating cost. The systems allow for the deposition of II-VI and III-V materials. Batch processing of single wafers or multiple wafers is available. The systems are designed to process wafer sizes as specified by the end user. A temperature controlled showerhead delivering exact quantities of precursors and gases, coupled with substrate rotation during deposition, provides excellent deposition uniformity.
The item is only for end user. The item is subject to prior sale without notice.
SS5965