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AG Associates 2101 Rapid Thermal Processing System

Description

Please contact us for the availability of the following used AG Associates 2101 Rapid Thermal Processing System  semiconductor equipment.

Rapid Thermal Processing System for 3″-5″ Wafers

Manufacturer AG Associates
Model 2101
Description Rapid Thermal Processing System for 3 inch
Other Information
  • Applications: Implant Activation, Silicide Formation, Oxide Reflow (PSG & BPSG), Alloying
  • Cassette to Cassette Handling of 3”-5” Wafers
  • Microprocessor-controlled
  • 60-100 Wafers per Hour Throughput, Depending on Anneal Cycle
  • 400-1150ºC Steady-State Temperature Range
  • 1-300 Seconds Anneal Time
  • Controlled Ambient for up to 4 Gases

The items are subject to prior sale without notice. These items are only for end users.

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