Description
Please contact us for the availability of the used PLASMA SCIENCES R.I.E. 200W semiconductor process Equipment.
PLASMA SCIENCES R.I.E. 200W , TABLE TOP REACTIVE ION ETCHER , ONE WAFER UP TO 6″ DIAMETER PER CYCLE. TURBO PUMPED MICROPROCESSOR, CONTROLLED ROUGHING PUMP MFC CONTROLS FOR 3 GASES.
The items are subject to prior sale without notice. These items are only for end users.
SS2424

