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MRC 943 Sputtering System

Description

Please contact us for the availability of the MRC 943 Sputtering System used semiconductor equipment.

Down Sputter System. Fully automated controlled system. Recipe storage. Hi-Vac and heat load lock with CTI pump. CTI cryo pumped main chamber. 10 kW DC supply. MRC 1.5 kW RF power supply. RF etch. Three RF/DC Planer cathodes. System will have a major PM performed and will be fully operational to the original OEM spec’s.

The items are subject to prior sale without notice. These items are only for end users.

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SS5626

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