Description
Please contact us for the availability of the Denton Vacuum Explorer 14 used semiconductor equipment.
Four Target RF DC Sputtering System with Loadlock. Versatile high vacuum R&D and pilot production thin film magnetron sputtering system. Graphical user interface displays all features and system functions. Currently configured with four RF/DC stack mount 3 in. dia. magnetron sputter cathodes. Cathodes can be moved so gap between target and substrate can be variable. Unit comes with adapter plates so that two of the cathodes can be mounted on an angle for confocal sputtering. All four currently mounted straight down. Load lock and main chamber are turbo pumped and chamber turbo has recently been replaced. Variable speed rotating substrate holder with RF bias control. Two gas inputs controlled via MFC, AR, O2. Quartz substrate heaters in chamber for heat up to 150 deg C. RF and DC magnetron power supplies. Previously sputtered Si, Si, SiO2, Si.
The items are subject to prior sale without notice. These items are only for end users.
SS5626