Description
Please contact us for the availability of the used semiconductor equipment.The items are in Asia and are subject to prior sale without notice. The items are only for end users.
1 | AMAT | CENTURA 5200 | CVD | DxZ (SiLAINE) |
2 | AMAT | CENTURA 5200 | CVD | WxZ |
3 | AMAT | CENTURA 5200 | CVD | WxZ |
4 | AMAT | CENTURA 5200 | CVD | WxZ |
5 | AMAT | CENTURA EMxP+ | CVD | 3CH (Optima Type) |
6 | AMAT | CENTURA MCVD | CVD | Tungsten 4CH (Optima Type) |
7 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
8 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
9 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
10 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
11 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
12 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
13 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
14 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
15 | AMAT | CENTURA MCVD | CVD | WxZ Optima |
16 | AMAT | P5000 | CVD | Delta Dlh |
17 | AMAT | P5000 | CVD | Delta Dlh |
18 | AMAT | P5000 | CVD | Delta Teos |
19 | AMAT | P5000 | CVD | Delta Teos |
20 | AMAT | P5000 | CVD | Delta Teos |
21 | AMAT | P5000 | CVD | Delta Teos 3ch, Sputter 1ch |
22 | AMAT | P5000 | CVD | Delta Teos 3ch, Sputter 1ch |
23 | AMAT | P5000 | CVD | Delta Teos 3ch, Sputter 1ch |
24 | AMAT | P5000 | CVD | Delta Teos 3ch, Sputter 1ch |
25 | AMAT | P5000 | CVD | Delta Teos 3ch, Sputter 1ch |
26 | AMAT | P5000 | CVD | Delta Teos 3ch, Sputter 1ch |
27 | AMAT | P5000 | CVD | DxL |
28 | AMAT | P5000 | CVD | DxL |
29 | AMAT | P5000 | CVD | DxL |
30 | AMAT | P5000 | CVD | DxL |
31 | AMAT | P5000 | CVD | DxL 2CH |
32 | AMAT | P5000 | CVD | DxZ 4CH |
33 | AMAT | P5000 | CVD | PECVD |
34 | AMAT | P5000 | CVD | SACVD Delta ,Teos |
35 | AMAT | P5000 | CVD | SACVD Delta Teos 3ch, sputter 1ch |
36 | AMAT | P5000 | CVD | Sputter |
37 | AMAT | P5000 | CVD | Teos |
38 | AMAT | P5000 | CVD | Teos |
39 | AMAT | P5000 | CVD | Teos |
40 | AMAT | P5000 | CVD | Teos 2ch, Sputter 2ch |
41 | AMAT | P5000 | CVD | Teos 2ch, Sputter 2ch |
42 | AMAT | P5000 | CVD | Teos 2ch, Sputter 2ch |
43 | AMAT | P5000 | CVD | Teos 3ch, Sputter 1ch |
44 | AMAT | P5000 | CVD | Teos, DxL |
45 | AMAT | P5000 | CVD | WxL |
46 | AMAT | P5000 | CVD | WxL |
47 | AMAT | P5000 | CVD | WxL |
48 | AMAT | P5000 | CVD | WxZ |
49 | AMAT | P5000 | CVD | WxZ |
50 | AMAT | P5000 | CVD | WxZ |
51 | AMAT | P5000 | CVD | WxZ 1ch, Sputter 1ch |
52 | AMAT | P5000 | CVD | WxZ 1ch, Sputter 1ch |
53 | AMAT | P5000 | CVD | WxZ 2ch, Sputter 1ch |
54 | AMAT | P5000 | CVD | WxZ Mark II |
55 | AMAT | CENTURA 5200 | ETCHER | MxP Poly |
56 | AMAT | P5000 | ETCHER | Mark II Metal |
57 | AMAT | P5000 | ETCHER | Mark II OXIDE |
58 | AMAT | P5000 | ETCHER | MxP |
59 | AMAT | P5000 | ETCHER | MxP+ metal |
60 | AMAT | P5000 | ETCHER | MxP+ metal |
61 | AMAT | P5000 | ETCHER | MxP+ Poly |
62 | AMAT | P5000 | ETCHER | No Chamber (PLIS type) |
63 | AMAT | Centura RTP | RTP | Tpcc / Xe+ / Atm |
64 | AMAT | Centura RTP | RTP | Tpcc / Xe+ / Atm |
65 | AMAT | Centura RTP | RTP | Tpcc / Xe+ / Rp(ISSG) |
66 | AMRAY | SEM-3800C | MET | |
67 | APPIIED BOISYSTEM | ABI-3700 ANALYZER | MET | Automatic Sequencer |
68 | AUGUST | CV-9812 | MET | Wafer Carrier Inspection Tool |
69 | AXCELIS | Fusion 200 MCU | ASHER | Asher |
70 | BMR | HIDEP | CVD | PECVD |
71 | BMR | GAN (A49-3) | ETCHER | Etcher |
72 | BROOKS | METARA 7200 | MET | Overlay |
73 | BROOKS | SORTER MTX 2000 | ETC | |
74 | BROOKS | SORTER MTX 2000 | ETC | |
75 | CANON | FPA-5000 ES3 (Open) | PHOTO | KrF Scanner (Gigaphoton G21K3) |
76 | CANON | FPA-5000 ES3 (SMIF) | PHOTO | KrF Scanner (NO Laser) |
77 | CARL ZEISS | S-INDUSTRIAL | ETC | Zeiss Excistar S-industrial |
78 | CYBER OPTICS | CYBERSCAN C212/110 | MET | Laser Measure |
79 | DNS | SK-200W-AVPF | PHOTO | Coater / Developer system (2C/2D) |
80 | DNS | SK-200W-BVPE | PHOTO | i-Line Photo Track Coater (3C3D) |
81 | DNS | SK-80B-BVPF | PHOTO | Coater (3C) |
82 | DNS | SK-80BW-AVPE | PHOTO | Coater/ Developer (2C/2D) |
83 | DNS | SK-80BW-BVPE | PHOTO | Coater/ Developer (2C/3D) |
84 | DNS | SK-W80B-AVPE | PHOTO | Coater/ Developer (2C/2D) |
85 | DNS | SK-W80B-AVPE | PHOTO | Coater/ Developer (2C/2D) |
86 | DNS | SK-W80A-AVP | PHOTO | Color Track (2C 1D) |
87 | DNS | SKW-80A-AVPE | PHOTO | Developer (3D) |
88 | DNS | SKW-80A-AVPE | PHOTO | Track (1C2D) |
89 | DNS | SD-W80A-AVP | PHOTO | Developer system (1D) |
90 | DNS | SSW-60A-AR | PHOTO | Scrubber (1F/1B) |
91 | DNS | SSW-60A-AR | PHOTO | Scrubber (4B) |
92 | DNS | SSW-80A-A | PHOTO | Scrubber (Part machine) |
93 | ELECTROGLAS | EG4090 | PROBER | Automatic Wafer Prober |
94 | ELECTROGLAS | EG4090 | PROBER | Automatic Wafer Prober |
95 | ELECTROGLAS | EG4090 | PROBER | Automatic Wafer Prober |
96 | ELECTROGLAS | EG4090 | PROBER | Automatic Wafer Prober |
97 | ELECTROGLAS | EG4090U | PROBER | Automatic Wafer Prober |
98 | ELECTROGLAS | EG4090U | PROBER | Automatic Wafer Prober |
99 | EO TECHNOLOGY | FOR GLASS PANEL | MET | Laser Marker for Glass |
100 | ESI | M9275 | MET | Laser Repair |
101 | ESI | M9825 | MET | Laser Repair |
102 | ESI | M9825 | MET | Laser Repair |
103 | ESI | M9825 | MET | Laser Repair |
104 | ESI | M9830 | MET | Laser Repair |
105 | ESI | M9830 | MET | Laser Repair |
106 | FSM | SYMPHONYMC | MET | Life Time |
107 | GASONICS | IRIDIA 4800 DL | ASHER | Stripper / Asher |
108 | GASONICS | IRIDIA 4800 DL | ASHER | Stripper / Asher |
109 | GASONICS | IRIDIA 4800 DL | ASHER | Stripper / Asher |
110 | GASONICS | IRIDIA 4800 DL | ASHER | Stripper / Asher |
111 | GASONICS | IRIDIA 4800 DL | ASHER | Stripper / Asher |
112 | GEMINI | GEMINI III E | CVD | EPI Reactor Batch |
113 | HITACHI | RS-4000 | MET | Defect Review Sem |
114 | HITACHI | RS-4000 | MET | Defect Review Sem |
115 | HITACHI | S-4160 | MET | FE Sem |
116 | HITACHI | S-5000 | MET | FE Sem |
117 | HITACHI | S-5000 | MET | FE Sem |
118 | HITACHI | S-5000 | MET | FE Sem |
119 | HITACHI | S-5000 | MET | FE Sem |
120 | HITACHI | S-5000 | MET | FE Sem |
121 | HITACHI | S-5000 | MET | FE Sem |
122 | HITACHI | S-7800 | MET | CD Sem |
123 | HITACHI | S-7800HSA | MET | CD Sem |
124 | HITACHI | UA-7200 | ASHER | Stripper/Asher |
125 | HITACHI | LS-6800 | MET | Wafer Surface Inspection |
126 | J.A.WOOLAM | VUV-VASE VU302 (Gen I) | MET | Ellipsometer |
127 | JEOL | JWS-7500E | MET | Wafer Inspection System |
128 | JEOL | JSM-5600 | MET | CD Sem |
129 | JEOL | JSM-6340F | MET | FE Sem |
130 | JEOL | JSM-6700F | MET | FE Sem |
131 | JEOL | JWS-7500E | MET | Wafer Inspection System |
132 | KARLSUSS | ACS 200 | PHOTO | Coater / Developer |
133 | KARLSUSS | RC 16 | PHOTO | Spin Coater |
134 | KARLSUSS | RC 16(RC5) | PHOTO | Spin Coater |
135 | KARLSUSS | PM8 | PROBER | Prober |
136 | KLA_TENCOR | 2132 (mainbody only) | MET | Inspection Unit |
137 | KLA_TENCOR | 2350 | MET | High-Resolution Imaging Inspection |
138 | KLA_TENCOR | 2350(Smif type) | MET | High-Resolution Imaging Inspection |
139 | KLA_TENCOR | AIT | MET | Particle Review |
140 | KLA_TENCOR | AIT I | MET | Patterned Wafer Inspection |
141 | KLA_TENCOR | AIT UV | MET | Darkfield Defect Inspection |
142 | KLA_TENCOR | AIT XP+ | MET | Darkfield Defect Inspection |
143 | KLA_TENCOR | Archer AIM | MET | Overlay |
144 | KLA_TENCOR | FLX-2320 | MET | Film stress measurement |
145 | KLA_TENCOR | FLX-2320 | MET | Film stress measurement |
146 | KLA_TENCOR | P-2 | MET | Disk Profiler |
147 | KLA_TENCOR | P-12 | MET | Disk Profiler |
148 | KLA_TENCOR | PROMETRIX FT750 | MET | Film Thickness Measurement |
149 | KLA_TENCOR | PROMETRIX FT750 | MET | Film Thickness Measurement |
150 | KLA_TENCOR | SP1 Tbi | MET | Unpatterned wafer inspection |
151 | KLA_TENCOR | THERMA-WAVE OP 2600 |
MET | Opti-Probe |
152 | KLA_TENCOR | THERMA-WAVE OP 2600 |
MET | Opti-Probe |
153 | KLA_TENCOR | THERMA-WAVE OP 2600 |
MET | Opti-Probe |
154 | KLA_TENCOR | THERMA-WAVE OP 2600B | MET | Opti-Probe |
155 | KLA_TENCOR | THERMA-WAVE OP 2600B | MET | Opti-Probe |
156 | KLA_TENCOR | THERMA-WAVE OP 2600B | MET | Opti-Probe |
157 | KLA_TENCOR | THERMA-WAVE OP 2600B | MET | Opti-Probe |
158 | KLA_TENCOR | THERMA-WAVE OP 2600 DUV |
MET | Opti-Probe |
159 | KORNIC (AP system) | RTP-600M | CVD | RTP, Wafer Diffusion |
160 | LABOTECH | Hot Plate | PHOTO | Photonics |
161 | LAM | 4720 | ETCHER | Oxide Etch |
162 | LAM | Raindow4500 | ETCHER | Etcher |
163 | LASERTEC | BGM300 | MET | Wafer Surface Analyzing and VIsualization System |
164 | LEICA | INS-2000 | MET | Review Station |
165 | LG SEMICON | CLS-9002 | MET | 3rd Optical Inspection |
166 | LINDA | IV5_HI | MET | |
167 | LUMONICS | SUPERCLEAN | ETC | Laser Marking System(Lamp type) |
168 | NANO OPTICS | HAZE 2 | ETC | Nano Optics Haze 2 |
169 | NANOMETRICS | 9-7200-0195E | MET | Mask & Wafer Inspection |
170 | NEC | SL-473D2 | MET | Si Wafer Marker |
171 | NEC | SL-473F | MET | Si Wafer Marker |
172 | NIKON | 3 | MET | Opti station |
173 | NIKON | 3 | MET | Opti station |
174 | NIKON | 3A | MET | Opti station |
175 | NIKON | NSR-4425i | PHOTO | Stepper (left) |
176 | NIKON | NSR-4425i | PHOTO | Stepper (left) (FIA) |
177 | NIKON | NSR-S204B | PHOTO | Scanner DUV (GigaphtonI G20K2 KRF laser) |
178 | NIKON | NSR-S204B | PHOTO | Scanner DUV (GigaphtonI G20K2 KRF laser) |
179 | NIKON | NSR-S306B | PHOTO | Scanner DUV |
180 | NOVELLUS | Concept 2 Speed | CVD | Triple Chamber, MAG 2000 |
181 | OXFORD | 800+ | ETCHER | RIE |
182 | PLASMA THERM | WAFER/ BATCH 740 | ETCHER | Dual Plasma Etch And Rie |
183 | PLASMA THERM | WAFER/ BATCH 741 | ETCHER | Dual Plasma Etch And Rie |
184 | PSC | DES-220-456AVL | ETCHER | Dry Etching System |
185 | RAYTEX | RXW-800 | MET | Edge Scan |
186 | RIGAKU | XRF3640 (Handle include) |
MET | Wafer/ Disk Analyzer |
187 | RIGAKU | XRF3640 (Handle not include) |
MET | Wafer/ Disk Analyzer |
188 | RUDOLPH | FE-3 | MET | Focus Ellipsometer |
189 | RUDOLPH | FE-4D | MET | Focus Ellipsometer |
190 | RUDOLPH | WS2500 | MET | |
191 | RUDOLPH | WS2500 | MET | |
192 | RUDOLPH | WS2500 | MET | |
193 | RUDOLPH | WS2500 | MET | |
194 | RUDOLPH | MP1-200 | MET | Film thickness measurement |
195 | RUDOLPH | MP1-200 | MET | Film thickness measurement |
196 | RUDOLPH | MP1-200 | MET | Film thickness measurement |
197 | RUDOLPH | MP1-200 | MET | Film thickness measurement |
198 | SSM | 5200 | MET | Resistivity |
199 | SVS | MSX1000 | ETC | TRACK_SVS#02 MSX1000 |
200 | TEGAL | PLASMA 900E | ETCHER | Plasma Dry Etch |
201 | TEGAL | PLASMA 903E | ETCHER | Plasma Dry Etch |
202 | TEKRONIX | 1765 | MET | Vector Analyzer |
203 | TEL | 8500 | ETCHER | Etcher |
204 | TEL | 8500 | ETCHER | Etcher |
205 | TEL | 8500 | ETCHER | Etcher |
206 | TEL | 8500 | ETCHER | Etcher |
207 | TEL | P-8 | PROBER | Automatic Wafer Prober |
208 | TEL | P-8 | PROBER | Automatic Wafer Prober |
209 | THERMO FISHER | ECO 1000 | MET | FTIR System |
210 | VARIAN | MBB | PVD | |
211 | VARIAN | M2I | PVD | Sputter |
212 | VARIAN | M2I | PVD | Sputter |
213 | GYE-12000 | ETC | Evaporator System |
SS5588