Description
Used Semiconductor Equipment
Valid Term: These are subject to prior sale. These are only for end user. Appreciate your time.
Location: SS9399W-20250121
No. | Maker | Model | Size | Description |
1 | Nikon | NSR2205i14E | 8 | Stepper |
2 | Nikon | NSR2205i12D | 6 | Stepper |
3 | Nikon | NSR2205i11D | 6 | Stepper |
4 | Nikon | NSR2205i10C | 6 | Stepper |
5 | Nikon | NSR1755i7A | 6 | Stepper |
6 | Nikon | NSR1505i7A | 6 | Stepper |
7 | Nikon | NSR G8C | 6 | Stepper |
8 | Nikon | NSR1505G7 | 6 | Stepper |
9 | TEL | ACT8(2C2D) | 8 | 2C2D |
10 | TEL | ACT8(4C4D) | 8 | 4C4D |
11 | TEL | Mark8(2C2D) | 8 | 2C2D |
12 | TEL | Mark8(2C2D) | 8 | 2C2D |
13 | TEL | Mark7(1S1C2D) | 6 | 1S1C2D |
14 | TEL | Mark7(2C) | 6 | 2C |
15 | TEL | Mark7(3D) | 6 | 3D |
16 | TEL | MarkVz(1S1C2D) | 6 | 1S1C2D |
17 | TEL | MarkVz(1S1C2D) | 6 | 1S1C2D |
18 | TEL | MarkVz(2C) | 6 | 2C |
19 | TEL | MarkVz(2D) | 6 | 2D |
20 | TEL | MarkVz(2C) | 6 | 2C |
21 | TEL | MarkVz(2D) | 6 | 2D |
22 | TEL | MarkVz(2D) | 6 | 2D |
23 | TEL | MarkVz(2D) | 6 | 2D |
24 | TEL | MarkVz(2C) | 6 | 2C |
25 | TEL | MarkVz(2D) | 6 | 2D |
26 | TEL | MarkV(2D) | 6 | 2D |
27 | TEL | MarkV(2D) | 6 | 2D |
28 | DNS | SK-80BW-AVPE | 6 | 1C2D |
29 | DNS | SC-80BW-AV | 6 | 2C |
30 | DNS | SD-80BW-AVPE | 6 | 2D |
31 | DNS | SK-80BW-AVPE | 6 | 1C2D |
32 | DNS | SS-80A | 6 | 4 units,2jetspray,2backside |
33 | DNS | SS-80A | 6 | 4 units,2jetspray,2backside |
34 | DNS | SS-80BW-AR | 6 | 6 units,3 Spray,3 backside, |
35 | DNS | SS-80BW-AR | 6 | 6 units,3 Spray,3 backside, |
36 | DNS | SCW-60AVFG | 6 | SOG or Polimide coater |
37 | DNS | SS-W60A-AR | 6 | SCRUBBER |
38 | DNS | SD-W60A-AVN | 6 | 2D |
39 | FSI | MERCURY | 6 | wet |
40 | FSI | MERCURY | 6 | wet |
41 | Fusion | M200PCU | 5,6 | Bake |
42 | Fusion | M200PCU | 5,6 | Bake |
43 | Fusion | 150PCJ | 6 | Bake |
44 | SEN | GSD-iii-180 | 8 | IHC |
45 | AMAT | Pi9500XR | 6 | HC in Nantong |
46 | AMAT | Pi9500XR | 6 | HC in Nantong |
47 | AMAT | XR200S | 6 | 2024Q3 release,HC IMP |
48 | AMAT | XR200S | 6 | 2024Q3 release,HC IMP |
49 | AMAT | PI9500 | 6 | IHC |
50 | Axcelis | GSD200E2 | 8 | IHC |
51 | Axeclis | GSD200 | 6 | IHC |
52 | SEN | NV-GSD-A-160 | 6 | IHC |
53 | SEN | NV-GSDⅢ-90 | 8 | IHC |
54 | SEN | NV-GSD-A-80 | 5 | IHC |
55 | SEN | NV-GSD-A-80 | 8 | IHC |
56 | EATON | NV10-160 | 6 | IHC |
57 | EATON | NV8250HT | 8 | IMC |
58 | Varian | E500HP | 6 | IMC |
59 | Varian | E220 | 6 | IMC |
60 | EATON | 6200AV | 6 | IMC |
61 | EATON | 6200A | 6 | IMC |
62 | Varian | 200SJ | 6 | IMC |
63 | AMAT | QuantumX+ | 12 | IHC |
64 | AMAT | Endura5500 | 6 | PVD |
65 | MRC | Redux | 6 | PVD |
66 | MRC | Redux | 6 | PVD |
67 | MRC | Markii | 6 | 2024Q3 release |
68 | MRC | Markii | 6 | 2024Q3 release |
69 | MRC | MarkiV | 6 | PVD |
70 | MRC | MarkiV | 6 | PVD |
71 | MRC | MarkiV | 6 | PVD |
72 | MRC | MarkiV | 8 | PVD |
73 | MRC | MarkiV | 8 | PVD |
74 | Varian | 3190 | 5 | PVD |
75 | Varian | 3190 | 5 | PVD |
76 | Varian | 3190 | 5 | PVD |
77 | Novellus | Concept 1-200 | 6 | SiO2/SiN |
78 | Novellus | Concept 1 | 6 | SiO2/SiN |
79 | Novellus | Concept 1 | 6 | TEOS |
80 | Novellus | Concept 1 | 6 | SiO2/SiN |
81 | Novellus | Concept 1 | 6 | TEOS |
82 | Novellus | Concept 1 | 6 | TEOS |
83 | Novellus | Concept 1 | 6 | SiO2/SiN |
84 | Novellus | Concept 1 | 6 | SiO2/SiN |
85 | AMAT | P5000CVD(hotboxIV) | 6 | 3 chamber ,hotbox IV |
86 | AMAT | P5000CVD(injection) | 6 | 3chamber,injection |
87 | AMAT | P5000CVD(injection) | 6 | 2CH CVD injection,2CH Marki |
88 | AMAT | P5000CVD(injection) | 6 | 4 chamber,injection |
89 | AMAT | P5000CVD(injection) | 6 | 4 chamber,injection |
90 | AMAT | P5000 etch | 6 | 2CH Markii etch |
91 | Lam | Alliance9400Dsie | 6 | 3 Chamber |
92 | Lam | Alliance9400Dsie | 8 | 3 Chamber |
93 | Lam | Alliance4720 | 6 | w etch |
94 | SPP(SPTS) | VPX-PEGASUS | 6 | 2CH,Si deep trench |
95 | TEL | UnityiiE 855DS | 6 | 2CH,oxide etch |
96 | TEL | UnityiiE 655PP | 8 | 2CH,oxide etch |
97 | TEL | UnityiiE 655PP | 8 | 2CH,oxide etch |
98 | TEL | UnityiiS 855II | 6 | 2CH,oxide etch |
99 | TEL | UnityiiE 655II | 6 | 2CH,oxide etch |
100 | TEL | UnityiiE 855DI | 6 | 2CH,oxide etch |
101 | LAM | Rainbow 4520i | 6 | Oxide etch |
102 | LAM | Rainbow 4520i | 6 | Oxide etch |
103 | LAM | Rainbow 4520 | 6 | Oxide etch |
104 | LAM | Rainbow 4520 | 6 | Oxide etch |
105 | LAM | Rainbow 4420 | 6 | Poly etch |
106 | LAM | Rainbow 4420 | 6 | Poly etch |
107 | LAM | Rainbow 4420 | 8 | Poly etch |
108 | LAM | Rainbow 4420 | 8 | Poly etch |
109 | LAM | Rainbow 4420 | 8 | Poly etch |
110 | LAM | Rainbow 4420 | 6 | Poly etch |
111 | LAM | Rainbow 4420 | 8 | Poly etch |
112 | LAM | Rainbow 4420 | 8 | Poly etch |
113 | LAM | Rainbow 4600 | 8 | Poly etch |
114 | LAM | TCP9400SE | 6 | Poly etch |
115 | LAM | TCP9400SE | 6 | Poly etch |
116 | LAM | TCP9400SE | 6 | Poly etch |
117 | LAM | TCP9600SE | 6 | Metal etch |
118 | LAM | TCP9600SE | 6 | Metal etch |
119 | TEGAL | Tegal901(4 sets) | 5 | SiN etch |
120 | TEL | TE8500 | 6 | Oxide etch with ATC |
121 | TEL | TE8500 | 8 | Oxide etch with ATC |
122 | TEL | TE8500 | 8 | Oxide etch |
123 | TEL | TE8400 | 8 | Poly etch |
124 | AG | HP8800 | 8 | RTA |
125 | AG | HP8800 | 8 | RTA |
126 | AG | HP8800 | 6 | RTA |
127 | AG | HP8800 | 6 | RTA |
128 | Mattson | Aspenii | 6 | Asher,single chamber |
129 | Mattson | Aspenii | 6 | Asher |
130 | Mattson | Aspenii | 8 | Asher |
131 | Mattson | Aspenii | 8 | Asher |
132 | Gasonics | L3510 | 6 | Asher |
133 | Gasonics | A1000 (12 sets) | 6 | Asher |
134 | PSC | DES-312 | 6 | Asher,3 chamber |
135 | Matrix | system one 303 | 6 | Asher |
136 | Semitool | 870( 20 sets) | 6 | Spin dryer |
137 | Hitachi | S8620 | 6 | CD SEM |
138 | Ultratech | UT1500 | 6 | stepper |
139 | Semix | TR6133( 2 sets) | 6 | SOG or Polimide coater |
140 | NANOMETRICS | Nanospec6100 | 6 | |
141 | NANOMETRICS | M6100 | 6 | |
142 | ECO1000 | 6 | ||
143 | Hitachi | S4700ii | 6 | FE SEM |
144 | TREX610 | 6 | ||
145 | SVG | SVG8800( 2 sets) | 5 | 2C |
146 | DNS | SPW612 | 6 | Al spin etcher |
147 | DNS | SPW621 | 6 | Al spin etcher |
148 | DNS | SPW621 | 6 | Al spin etcher |
149 | DNS | SPW621 | 6 | Al spin etcher |
150 | DNS | SPW813 | 8 | |
151 | DNS | SPW813 | 8 | |
152 | Ushio | PE-250R2SF2 | 6 | UV Bake |
153 | Bruce | S300 | 6 | Horizontal furnace |
154 | Bruce | S300 | 6 | Horizontal furnace |
155 | Thermco | 5204 | 6 | Horizontal furnace |
156 | Thermco | 5204 | 6 | Horizontal furnace |
157 | Thermco | 5204 | 6 | Horizontal furnace |
158 | Thermco | 5204 | 6 | Horizontal furnace |
159 | Thermco | 5204 | 6 | Horizontal furnace |
160 | Thermco | 5204 | 6 | Horizontal furnace |
161 | Thermco | 5204 | 6 | Horizontal furnace |
162 | Thermco | 5204 | 6 | Horizontal furnace |
163 | KE | DJ-853 | 6 | D-Poly |
164 | KE | DD-803V-8B | 8 | PYRO |
165 | KE | DD-812V | 8 | PYRO |
166 | TEL | Alpha 8S | 6 | Anneal |
167 | TEL | IW6 | 4,6 | H2-Sinter |
168 | TEL | IW6 | 4,6 | PyroB |
169 | TEL | IW6 | 4,6 | PyroA |
170 | TEL | IW6 | 4,6 | HTO |
171 | TEL | IW6 | 4,6 | TEOS |
172 | TEL | IW6 | 4,6 | D-Poly |
173 | TEL | IW6 | 6 | Pyro(含sic) |
174 | TEL | IW6 | 6 | Pyro(含sic) |
175 | TEL | IW6 | 6 | D-Poly |
176 | TEL | IW6 | 6 | TEOS |
177 | TEL | IW6 | 6 | TEOS |
178 | TEL | IW6 | 5,6 | LP-CVD |
179 | TEL | IW6 | 5,6 | Furnace (Vertical) Oxidatio |
180 | TEL | IW6 | 5,6 | Furnace (Vertical) Oxidatio |
181 | TEL | IW6 | 5,6 | Furnace (Vertical) Boron Dr |
182 | TEL | IW6 | 5,6 | Furnace (Vertical) Boron Dr |
183 | TEL | IW6 | 5,6 | Furnace (Vertical) Boron Dr |
184 | TEL | IW6 | 5,6 | Furnace (Vertical) Phospho |
185 | TEL | IW6 | 5,6 | Furnace (Vertical) Phospho |
186 | TEL | IW-6D | 5 | Furnace |
187 | KOKUSAI | DJ-833V | 6 | Furnace |
188 | TEL | IW-6D | 6 | Furnace |
189 | Koyo Thermo | VF-5100 | 5,6 | Furnace (Vertical) Boron D |
190 | Koyo Thermo | VF-5100 | 5,6 | Furnace (Vertical) Phosphor |
191 | Koyo Thermo | VF-5100 | 5,6 | Furnace (Vertical) Phospho |
192 | Koyo Thermo | VF-5100 | 5,6 | Furnace (Vertical) Boron D |
193 | Koyo Thermo | VF-5100 | 5,6 | Furnace (Vertical) Boron D |
194 | DNS | Lambda Ace | 5 | Film thickness Measurement |
195 | CANON | PLA601FA | 5,6 | Aligner |
196 | CANON | PLA501FA | 5 | Aligner |
197 | CANON | PLA601FA | 5,6 | Aligner |
198 | CANON | PLA601FA | 5,6 | Aligner |
199 | CANON | PLA501FA | 5 | Aligner |
200 | Okamoto | SVG502MKⅡ8B | 5,6 | Grinder |
201 | KLA/TENCOR | P-2 | 5 | Profiler |
202 | Ultratech | MERCURY200 | 8 | stepper |
203 | Ultratech | MERCURY200 | 8 | stepper |
204 | Ultratech | XLS200 | 8 | stepper |
205 | Semitool | SST221 | 5 | |
206 | Ultrafab(Amerimade) | Wet bench( 10 sets) | 6 | manual mode |
207 | Nikon | NSR504 | 6 | Reticle cleaner |
208 | KE | VR-70 | 5 | Resistivity Measurement |
209 | EVG | 40NT | 6 | Top to Bottom inspection |
210 | Toho kasei | HC clean | 6 | HF washing tool |
211 | RUDOLPH JAPAN | FE7 | Metrology & Inspection | |
212 | NIKON | ECLIPSE L200 | 6、8 | Metrology & Inspection |
213 | HITACHI | ISI600 | 5 | Metrology & Inspection |
214 | HITACHI | LS5000 | 4,5,6 | Metrology & Inspection |
215 | HITACHI | IS-3270 | 5 | Metrology & Inspection |
216 | HITACHI | LS-5000 | 5 | Metrology & Inspection |
217 | DNS | LA820 | 6 | RTP |
218 | DNS | LA820 | 6 | RTP |
219 | KOKUSAI | DD-7460 | 5 | Furnace |
220 | KOKUSAI | DD-7460 | 5 | Furnace |
221 | Fusion | GPS | 5 | Bake |
222 | AIRTECH | AHO-200-54K | 6 | Bake |
223 | M・SETEK | VL-6000 | 5・6 | LIFT OFF |
224 | ACCRETECH | A-FP-210A | CMP | |
225 | OLYMPUS | MX51 | 6 | Metrology & Inspection |
226 | NIKON | NRM1000 | 6 | Metrology & Inspection |
227 | NIKON | OST-5 | 5・6 | Metrology & Inspection |
228 | NIKON | OST-5 | 5・6 | Metrology & Inspection |
229 | DNS | NRM2 | 5・6 | Metrology & Inspection |
230 | NANOMETRICS | ナノスペック210 | 6 | Metrology & Inspection |
231 | Other | |||
232 | TEL | TE5000SATC | 6 | Plasma Etch |
233 | WINWIN50-1200S | Metrology & Inspection | ||
234 | KLA Tencor | KLA2552 | Metrology & Inspection | |
235 | KLA Tencor | KLA2552 | Metrology & Inspection | |
236 | OSHITARI | SNO-750HZ-D-SO-MP | 6 | Bake |
237 | miconductor Service | 88XX SYSTEM(P8000) | 6 | Coater |
238 | Rite Track | RiteTrack 88s | 6 | Coater |
239 | Rite Track | RiteTrack 88s | 6 | Coater |
240 | Thermco | HTR5100 | 6 | Furnace |
241 | Rigaku | SYSTEM3630 | 6 | Metrology & Inspection |
242 | OEMGroup Japan | Tegal903E | 6 | Plasma Etch |
243 | OEMGroup Japan | Tegal903E | 6 | Plasma Etch |
244 | YASHIMA | DF-25-2 | 6 | Bake |
245 | OSHITARI | SCOX-1300H-S | 6 | Bake |
246 | OSHITARI | 891019 | 5,6 | Bake |
247 | OSHITARI | 900723 | 5,6 | Bake |
248 | OSHITARI | SDB-2000H-S-MP | 5,6 | Bake |
249 | SANKEI | NA | 5,6 | Other |
250 | GIGA TECH | NSEC | 5,6 | Wet Chemical Process |
251 | OSHITARI | SCOX-1300HZ | 5,6 | Bake |
252 | KOKUSAI | DD-7460 | 5 | Furnace |
253 | KOKUSAI | DD-7460 | 6 | Furnace |
254 | OLYMPUS | AL-1MBL | 5,6 | Other |
255 | Hugle | CRD-4000 | 5,6 | Wet Chemical Process |
256 | KOKUSAI | DD-7460 | 5 | Furnace |
257 | OLYMPUS | NA | 6 | Metrology & Inspection |
258 | ULVAC | DEKTAK6M | 5,6 | Metrology & Inspection |
259 | SHINKOSEIKI | AAMF-C2280SPB | 5,6 | Metal dep |
260 | ULVAC | EBX-16C | 5,6 | Metal dep |
261 | C3541 | 6 | Metrology & Inspection | |
262 | ULVAC | DEKTAK3ST | 5,6 | Metrology & Inspection |
263 | ULVAC | DEKTAK3ST | 5,6 | Metrology & Inspection |
264 | SHINKOSEIKI | EXAM-Σ | 5,6 | Plasma Etch |
265 | TAKATORI | ATM-1100C | 5 | Tape/Detape |
266 | TAKATORI | ATRM-2100 | 6 | Tape/Detape |
267 | TAKATORI | ATRM-2200 | 5 | Tape/Detape |
268 | ULVAC | EBX-16C | 5,6 | Metal dep |
269 | KLA_TENCOR | JWS-7505 | Metrology & Inspection | |
270 | KLA_TENCOR | JWS-7700 | Metrology & Inspection | |
271 | TERADYNE | A340 | – | Wafer Tester |
272 | TEL | 19S | 4,5,6 | Wafer Prober |
273 | YOKOGAWA | TS2000 | – | Wafer Tester |
274 | YOKOGAWA | TS2000 | – | Wafer Tester |
275 | YOKOGAWA | TS2000 | – | Wafer Tester |
276 | YOKOGAWA | TS2000 | – | Wafer Tester |
277 | ANDO | UIC5040 | – | Wafer Tester |
278 | ADVANTEST | T3316 | – | Wafer Tester |
279 | ADVANTEST | T3316 | – | Wafer Tester |
280 | ADVANTEST | T3316 | – | Wafer Tester |
281 | ADVANTEST | T3316 | – | Wafer Tester |
282 | ADVANTEST | T3326A | – | Wafer Tester |
283 | ADVANTEST | T3326A | – | Wafer Tester |
284 | ADVANTEST | T3326A | – | Wafer Tester |
285 | ADVANTEST | T3326A | – | Wafer Tester |
286 | ADVANTEST | T3326A | – | Wafer Tester |
287 | ADVANTEST | T3326A | – | Wafer Tester |
288 | ADVANTEST | T3347A | – | Wafer Tester |
289 | ADVANTEST | T6535 | – | Wafer Tester |
290 | ADVANTEST | T6535 | – | Wafer Tester |
291 | ADVANTEST | T6535 | – | Wafer Tester |
292 | ADVANTEST | T6565 | – | Wafer Tester |
293 | ADVANTEST | T3332P | – | Wafer Tester |
294 | ADVANTEST | T3333 | – | Wafer Tester |
295 | ADVANTEST | T5371 | – | Wafer Tester |
296 | Keysight/KEITHLEY | PTIC | – | Wafer Tester |
297 | Keysight/KEITHLEY | PTIC | – | Wafer Tester |
298 | Keysight/KEITHLEY | PTIC | – | Wafer Tester |
299 | Keysight/KEITHLEY | PTIC | – | Wafer Tester |
300 | TEL | 20S | 4,5,6 | Marking Prober |
301 | TEL | 20S | 4,5,6 | Marking Prober |
302 | UVP | C-600 | – | EPROM Eraser |
303 | UVP | C-600 | – | EPROM Eraser |
304 | electroglas | PRM-2 | Wafer Prober | |
305 | HP | 4279A | Wafer Tester | |
306 | Manual Prober | Wafer Prober | ||
307 | HITACHI | LS-5000 | 5,6 | Metrology & Inspection |
308 | OLYMPUS | MX50 | 5 | Metrology & Inspection |
309 | THERMO ELECTRON | ECO-1000 | 5,6 | Metrology & Inspection |
310 | AMAT | P-7700 | 5,6 | Epi |
311 | AMAT | AMC7811 | 5,6 | Epi |
312 | AMAT | AMC7811 | 5,6 | Epi |
313 | AMAT | AMC7811 | 5,6 | Epi |
314 | AMAT | AMC7821 | 5,6 | Epi |
315 | AMAT | AMC7821 | 5,6 | Epi |
316 | OLYMPUS | MX50 | 5 | Metrology & Inspection |
317 | KOKUSAI | VR-70 | 5 | Metrology & Inspection |
318 | KOKUSAI | VR-70 | 5 | Metrology & Inspection |
319 | TEL | MODEL3100 | 5,6 | Furnace (Horizontal) |
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