Description
ULVAC NLD-6000 ICP Plasma Etcher
The items are subject to prior sale without notice. These items are only for end users. The trade mark belongs to Varian.
Condition: Used. We could not test it We sell it at AS IS WHERE IS.
Equipment ID:
(1)ID-SS7464-S-4
- This advanced plasma etching system was lightly used and professionally maintained by ULVAC service until it was recently decommissioned.
- The tool is plumbed for CF4, C3F8, C4F8, N2, O2, and Ar gases.
- Key features include ULVAC’s proprietary Neutral Loop Discharge (NLD) plasma technology that tailors the plasma field with very high plasma energy. This enables precise plasma etching of virtually any material. Their experience includes etching challenging substrates like quartz and silicon carbide (SiC). Unlike cyclical passivation systems, the NLD-6000 provides continuous passivation, delivering deep etch capability and high aspect ratios.
- Typical etches achieve hundreds of microns depth in SiC with aspect ratios exceeding 5:1. This production-grade system features cassette-to-cassette wafer handling, designed for high throughput and reliability in demanding fabrication environments. An exceptional tool for deep, high-precision plasma etching across diverse materials in advanced semiconductor and MEMS manufacturing.
