Description
Resist Coat Bake Develop Strip Photostabilize
Condition: Used
Valid Term: These are subject to prior sale. These are only for end user. Appreciate your time.
Location: CA, USA-SS7270W
Info for your reference.
- CEE Brewer Science Spin Coater model 200x for wafers up to 200mm (8″)
- CEE 200CBX Precision Coat Bake System
- Suss Microtec Labspin 8 resist coater for wafers up to 200mm
- Suss Microtec HP8 Hot Plate for up to 200mm substrates
- CEE Apogee 300 Bake Plate for maximum 12×12 substrates or 300mm round
- Specialty Coating Systems Spincoat G3P-8 photoresist coater with 8 inch diameter bowl
- CEE 150mm wafer centering tool for 100mmm vacuum chuck
- Specialty Coating Systems model 6808P programmable spin coater for max 200mm wafers
- MTI VTC-200 Programmable spin coater for maximum 8″ substrate
- IDI Integrated Designs resist pump
- CEE 200FX Coater for substrates up to 450mm or 14in x14in square with cabinet
- CEE100 developer with dual nozzles, 200mm wafer chuck, and base cabinet
- Suss Microtech RC8-MS2 coater
- Suss Microtec Delta 80 Gyrset coater
- karl Suss RC-5 spin coater with Gyrset for max 5in substrates
- Solitec 5110C photoresist coater for maximum 9in diameter substrate
- Brewer Science DSD-1
- Cybor 5126C/5126CE Photoresist Pump, Controller 505D/ 512F, 512H
- Millipore FAS Technologies W2501VS01/ W2501CC01 Thermoelectric Photoresist Cooler
- Suss RC8-MS3 Photoresist Spin Coater for max 200mm substrates
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