LSC-4000 Large Substrate

NANO-MASTER Megasonic Single Wafer and Mask Cleaners provide reproducible, uniform and state-of-art megasonic cleaning. We incorporate patented damage free megasonic cleaning, chemical cleaning, brush cleaning and drying in one process step. To achieve maximum cleaning optimization without substrate damage, the megasonic energy density must be kept slightly below the damage threshold at any point on the sample. NANO-MASTER’s patented technology assures uniform distribution of the acoustic energy across the entire surface of the substrate allowing ideal cleaning by maximizing the distributed energy while staying below the sample’s damage threshold. Depending on the application, certain options will further enhance the tool’s ability to remove unwanted particles and residues.

NANO-MASTER’s Large Substrate Cleaner (LSC) is a stand-alone cleaner which utilizes PC control for substrates up to 21″ OD. A LabVIEW interface through a touch screen provides greater control compared to the SWC systems and allows for controlled access levels such as operators, process engineers, and maintenance. The LSC incorporates the same, patented megasonic technology and chemical dispenses as the SWC systems, but the combination of LabVIEW control and the larger process chamber support additional options such as ozonated water, high pressure water, pelliclized reticle cleaning, and piranha. Upon request, automatic handling with robotic load/unload configurations can be added.

Features:

• 21” OD, 15”x15” substrates and 450mm wafer
• Damage free megasonic cleaning
• Variable speed PVA brush
• Chemical Dispenses with Suck Back Valves
• Dual drain for acids and solvents
• Fully automated PC based, recipe driven
• Touchscreen user interface
• Manual load and unload
• Safetly interlocks and alarm
• 32”x28” footprint

Options:

• Pelliclized reticle cleaning
• Double sided brush and megasonic cleaning
• Chemical delivery module
• Fill sensors for chemical bottles
• Piranha cleaning
• Ozonated DI water (20ppm of O₃)
• High pressure DI water
• Heated DI water
• Nitrogen ionizer
• CO2 injector with DIW resistivity monitor
• FM4910 materials
• Robotic loading/unloading with SMIF pod

Applications:

• Si and saphire wafers
• Chips on wafer frame
• Display panels
• ITO coated displays
• Patterned and un-patterned masks
• Mask blanks
• Pelliclized reticles
• Contact masks