Archive | Furnace LPCVD

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Disilane (Si2H6) offers several advantages over SiH4 for the polysilicon and amorphous Si LPCVD processes: higher deposition rates at low temperatures and better uniformity and smoothness. By growing at […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR The most widely used process gas for polysilicon LPCVD is silane (SiH4). Polysilicon LPCVD may be achieved using other alternative gases such as disilane (see Polysilicon by LPCVD […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Dopants such as phosphine and boron trichloride can be added to the process gas to adjust conductivity and stress. Doped polysilicon requires caged wafer boats for better uniformity. […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR TYTAN nitride LPCVD systems have been used to prepare nitride films needed to fabricate high-Q nitride resonators. Q values of a few million have been obtained using a […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Tystar Corporation has been working with universities and national labs to develop recipes for nano materials CVD for the past 30 years. A variety of nano materials can […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Annealing is used for purposes such as dopant diffusion/activation, oxide/glass densification, repair of damage done to crystal structure by ion implantation, silicide formation, reflow of PSG and BPSG […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR In these processes, nitrogen carries the liquid source from a bubbler to the process tube where it reacts with oxygen to form a borosilicate or phosphosilicate glass. Dopant […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR In this process, the wafers are loaded into boats along with solid sources that release B2O3 or P2O5 when heated. The dopant oxide condenses on the wafers and forms a […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR For optical wave guide applications thick (>10 µm) silicon dioxide films of excellent thickness and index of refraction uniformity are required. Tystar Corporation has been offering process technology […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Dry oxidation is slower than the wet process due to oxygen’s slower rate of diffusion through the silicon dioxide layer to the silicon/oxide interface where the oxidation reaction […]