Archive | Furnace LPCVD

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Silicon carbide’s strength, thermal conductivity, and stability in extreme environments make it a useful material for electronics and MEMS. Typical Film Thickness: 0.3 µm Batch Size: 25 Deposition […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR SIPOS (Semi-Insulating Polycrystalline Silicon) is a Low Pressure Chemical Vapor Deposition (LPCVD) process for the deposition of high resistivity polysilicon layers, which are primarily used in the fabrication […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Si-Ge devices extend the speed limit of about 3 GHz for standard silicon devices by at least another order of magnitude and have thus found applications in the […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Adding N2O to the silicon nitride LPCVD gas makes silicon oxynitride, which can provide the passivation and mechanical properties of the nitride and the low dielectric constant and […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Stochiometric Silicon Nitride LPCVD Typical film thickness: 0.1 – 2 µm Refractive index at 550 nm / 1.98 – 2.0 Batch Size: 50 Deposition rate: 3 – 4.5 […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Low stress nitride is performed at a high ratio of DCS to NH3 flow rates (typically ~ 6). The consequence of such silicon-enriched deposition is a very low tensile […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Silicon nitride is a hard, dense material used for diffusion barriers, passivation layers, oxidation masks, etch masks, ion implant masks, insulation, encapsulation, mechanical protection, MEMS structures, gate dielectrics, […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR TEOS is an abbreviation of Tetraethyl orthosilicate with its molecular formula, Si(OCH2CH3)4. A TEOS molecule takes a tetrahedral structure. TEOS is a colorless liquid at room temperature with […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR High temperature silicon dioxide is formed by the reaction of N2O and dichlorosilane. The oxide quality is comparable to the thermal oxidation process (with the exception of a […]

Tystar Equipment: MINI SERIES | STANDARD SERIES | NANO SEREIS | SOLAR SERIES | Photo-Enhanced CVD | Tystar Instruments: GAS CONTROL| MASS FLOW TESTER | FLOW CALIBRATOR Low temperature oxides are used for sacrificial layers, diffusion masks, ion implant masks, etch masks, insulation, and passivation. These processes run at a much lower temperature (400 – […]