Description
Typical NANOTECHNOLOGY Lab Fab Equipment
Please contact us for our Main Refurbished Equipment. Appreciate your time.
The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers.
1 | ABM 3000HR Mask Aligner |
2 | Acid Process Bench |
3 | AccuThermo AW 610 Rapid Thermal Processor |
4 | AccuThermo AW 820M Rapid Thermal Processor |
5 | Acid Process Bench |
6 | ADT 7100 Dicing Saw |
7 | Agilent AFM |
8 | Airco FC-1800 |
9 | Allwin21 AccuSputter AW4450 Sputtering Deposition Equipment |
10 | Anatech SCE-106 Barrel Asher |
11 | Anatech SCE-108 Barrel Asher |
12 | AnnealSys AS-One |
13 | AST Barrel Asher |
14 | Asylum AFM |
15 | AW-105R Plasma Asher Descum Equipment |
16 | AW-901eR Plasma Etcher equipment |
17 | AW-B3000 Plasma Asher Descum Equipment |
18 | Base Process Bench |
19 | Beamer and Tracer Lithography Software |
20 | Bottle Wash |
21 | Branson/IPC 3000 |
22 | Branson/IPC L3200 |
23 | Bruker Icon AFM |
24 | Cambridge NanoTech S200 ALD |
25 | Cascade PS-21 |
26 | CHA Evaporator |
27 | CHA Mark 50 |
28 | Chemical Vapor Deposition CVD |
29 | CPA S-Gun -Sputter |
30 | Denton Vacuum Explorer 14 Sputterer |
31 | E-Beam Resist Spin & Develop Bench |
32 | Electroglas EG 1034 |
33 | Electroglas EG 2001 |
34 | Electroglas EG 4090u+ |
35 | Electroglas EG 4090X |
36 | Electroplating Process Bench |
37 | Elionix ELS-7500EX EBL |
38 | Emscope SC-650 |
39 | Evatec Clusterline 200 II Sputter |
40 | EVG 510 Wafer Bonder |
41 | EVG 620 Wafer Bond Aligner |
42 | F.E.I.Quanta 200 |
43 | Filmetrics F40 Reflectometer |
44 | Filmetrics F50 Reflectometer |
45 | Filmetrics F50 Reflectometer – UV Filter |
46 | Gaertner L117 |
47 | Gasonics Aura 1000 |
48 | Gasonics Aura 2000 |
49 | Gasonics Aura 3000 |
50 | Gasonics Aura 3010 |
51 | Gasonics L3510 |
52 | Genesis HMDS Vapor Prime Oven |
53 | Heatpulse 210 |
54 | Heatpulse 310 |
55 | Heatpulse 410 |
56 | Heatpulse 4100 |
57 | Heatpulse 4100S |
58 | Heatpulse 4108 |
59 | Heatpulse 610 |
60 | Heatpulse 610I |
61 | Heatpulse 8108 |
62 | Heatpulse 8800 |
63 | Heidelberg DWL 66+ Laser Writer |
64 | HEWLETT PACKARD,Agilent HP 4062UX |
65 | HF Process Bench |
66 | HITACHI S-4700 |
67 | Horiba Raman |
68 | HV STM |
69 | Ion Beam Deposition Veeco NEXUS |
70 | IPG Photonics IX-255 Laser System |
71 | IPG Photonics IX280-DXF Laser System |
72 | JA Woollam V VASE Ellipsometer |
73 | Jandel Multi Height Four Point Probe |
74 | JEOL 7500F HRSEM |
75 | JEOL F200 |
76 | JEOL NEOARM |
77 | JETFIRST 100 -RTP |
78 | JETFIRST 150 -RTP |
79 | JETFIRST 200 RTP |
80 | Jipelec Jetfirst 200 |
81 | KLA Tencor P6 |
82 | KLA Tencor P-7 |
83 | KLA Tencor P7 Profilometer – 1 |
84 | KLA Tencor P7 Profilometer – 2 |
85 | Kulicke & Soffa 4523 Wire Bonder |
86 | Kurt J. Lesker Nano 36 Thermal Evaporator |
87 | Kurt J. Lesker PVD 75 – E-Beam/Thermal Evaporator |
88 | Kurt J. Lesker PVD 75 PRO-Line E-Beam Evaporator |
89 | Kurt J. Lesker PVD 75 PRO-Line Sputterer |
90 | Lam AutoEtch 490 |
91 | Lam AutoEtch 590 |
92 | Lam Rainbow 4420 |
93 | March Jupiter II Etcher |
94 | March PX-250 |
95 | Matrix 105 |
96 | Matrix 205 |
97 | Matrix 209S |
98 | Matrix 303 |
99 | Matrix 403 |
100 | Micromanipulator 4060 Probe Station |
101 | Microscope AFX-II |
102 | MPT Corp. RTP-600S Rapid Thermal Annealer |
103 | MPT RTP-3000 |
104 | MRC 603 693 TES |
105 | MRC 603 Sputter |
106 | MRC 643 -Sputter |
107 | MRC 8671 Sputtering |
108 | Nanonex NX2600 Nanoimprinter |
109 | Nanoscribe Photonic Professional GT |
110 | Negative Photoresist Develop Bench |
111 | Negative Photoresist Spinner Bench |
112 | Ovens and Hotplate Towers |
113 | OXFORD 100 RIE |
114 | Oxford 133 RIE |
115 | Oxford Instruments Plasma Lab 100 PECVD |
116 | Oxford Plasma Lab 80+ RIE |
117 | Oxford PlasmaPro 100 Cobra ICP |
118 | PDMS Process Bench |
119 | PECVD PlasmaTherm 790 |
120 | Perkin-Elmer 2400 |
121 | Perkin-Elmer 4400 |
122 | Perkin-Elmer 4450 |
123 | Plasma Etch BT1 |
124 | PlasmaEtch PE-100 |
125 | PlasmaLab 80 Plus |
126 | Plasmalab 80+ DPCVD |
127 | PlasmaTherm 700 |
128 | PlasmaTherm 700 |
129 | PlasmaTherm 720 |
130 | PlasmaTherm 720 |
131 | PlasmaTherm 790 |
132 | PlasmaTherm 790 RIE |
133 | Positive Photoresist Develop Bench |
134 | Positive Photoresist Spinner Bench |
135 | Princeton Instruments TriVista Spectrometer with Si and InGaAs array detectors |
136 | Probe Station |
137 | Quanta 600 FEG ESEM |
138 | Quantum Design MPMS 7 Tesla with Evercool |
139 | Quantum Design PPMS 9 T |
140 | Quantum Design PPMS 9 Tesla with Evercool II |
141 | Raith EBPG5200+ E-Beam Lithography System |
142 | Raman-NSOM |
143 | Resist Spinners |
144 | ResMap 178 |
145 | SAMCO RIE 10 NR |
146 | Sandvik LPCVD & Anneal Furnace |
147 | SAVANNAH S200-ALD |
148 | SCS Labcoter 2 (PDS 2010) Parylene Deposition System |
149 | SEM Sample Coater Hummer |
150 | Sloan Dektak II |
151 | SMI MOCVD |
152 | Solvent Process Bench |
153 | Spinner and Solvent Processing Benches |
154 | SPTS Rapier Si DRIE |
155 | Sputter AJA ATC 2000-F |
156 | Sputter AJA ATC 2200-V |
157 | Sputter AJA ATC 2200-V |
158 | STS ICP Bosch Process |
159 | STS ICP HRM |
160 | STS ICP Multiplex |
161 | STS PECVD |
162 | SU-8/PDMS Spin Bench |
163 | SUSS MicroTec AS8 AltaSpray Coater |
164 | SUSS MicroTec MA-6 Mask Aligner |
165 | Technics 2000 |
166 | Technics PE-IIA |
167 | Tegal 901e |
168 | Tegal 903e |
169 | Temescal BJD-1800 |
170 | Temescal BJD-1800 |
171 | Temescal FC-1800 |
172 | Temescal FC-1800 |
173 | Tencor Mgage-200 |
174 | Tencor Mgage-300 |
175 | Tencor Sonogage 200 |
176 | TES FC-1800 |
177 | TESCAN S8000X FIB/SEM |
178 | ThermoFisher Krios cryo-EM |
179 | TIRF |
180 | Tousimis 931-C Critical Point Dryer |
181 | UHV VT AFM |
182 | Ultratech Fiji G2 ALD |
183 | Varian 3120 E-Beam |
184 | Veeco Savannah S200 ALD |
185 | Verteq Superclean Spin Rinse Dryer |
186 | Xactix e1 XeF2 Etch System |
187 | Zeiss Axio Imager M2m Microscope |
188 | Zeiss Smartzoom5 2D/3D Optical Microscope |
SS3439-20240524