Typical NANOTECHNOLOGY Lab Fab Equipment

Description

Please contact us for our Main Refurbished Equipment. Appreciate your time.

The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers.

1	3D direct laser writing lithography – Nanoscribe
2	AccuSputter AW4450 Sputtering Deposition equipment
3	Airco FC-1800
4	Allwin21 903eR plasma etcher
5	Allwin21 AccuThermo AW610M rapid Thermal Processor
6	AnnealSys AS-One
7	AST Barrel Asher
8	Atomic Force Microscopy (AFM) – Veeco Dimension 3100 AFM
9	AW-105R Plasma asher descum
10	AW-901eR plasma etcher
11	AW-B3000 Plasma Asher Descum, Allwin21
12	Branson/IPC 3000
13	Branson/IPC L3200
14	Cascade PS-21
15	CHA Evaporator
16	CHA Mark 50
17	CPA S-Gun -Sputter
18	Critical point dryer – Autosamdri
19	Deposition system ICPECVD – Oxford PlasmaPro100 ICPECVD
20	Double sputter coater – Leica EM ACE600
21	Dualbeam FIB / SEM – FEI Helios nanolab 600
22	E-Beam lithography system – Voyager
23	E-beam PVD system – E-flex
24	Electroglas EG 1034
25	Electroglas EG 2001
26	Electroglas EG 4090u+
27	Electroglas EG 4090X
28	Ellipsometry – Ellipsometer VB-400 J.A. Woollam
29	Emscope SC-650
30	Etching – XeF2 etcher
31	F.E.I.Quanta 200
32	Gaertner L117
33	Gasonics Aura 1000
34	Gasonics Aura 2000
35	Gasonics Aura 3000
36	Gasonics Aura 3010
37	Gasonics L3510
38	Heatpulse 210
39	Heatpulse 310
40	Heatpulse 410
41	Heatpulse 4100
42	Heatpulse 4100S
43	Heatpulse 4108
44	Heatpulse 610
45	Heatpulse 610I
46	Heatpulse 8108
47	Heatpulse 8800
48	HEWLETT PACKARD,Agilent HP 4062UX
49	High speed saw – DISCO DAC-2SP/86
50	HITACHI S-4700
51	JETFIRST 100 -RTP
52	JETFIRST 150 -RTP
53	JETFIRST 200 RTP
54	Jipelec Jetfirst 200
55	KLA Tencor P6
56	KLA Tencor P-7
57	Lam AutoEtch 490
58	Lam AutoEtch 590
59	Lam Rainbow 4420
60	Low Pressure Oxygen Plasma System – Sinvacon Diener Pico
61	March PX-250
62	Matrix 105
63	Matrix 205
64	Matrix 209S
65	Matrix 303
66	Matrix 403
67	Microscope AFX-II
68	MPT RTP-3000
69	MRC 603 693 TES
70	MRC 603 Sputter
71	MRC 643 -Sputter
72	MRC 8671 Sputtering
73	Optical microscope – Zeiss Axioskop2 mat
74	OXFORD 100 RIE
75	Oxford 133 RIE
76	Perkin-Elmer 2400
77	Perkin-Elmer 4400
78	Perkin-Elmer 4450
79	Plasma Etch BT1
80	PlasmaEtch PE-100
81	PlasmaLab 80 Plus
82	Plasmalab 80+ DPCVD
83	PlasmaTherm 700
84	PlasmaTherm 700
85	PlasmaTherm 720
86	PlasmaTherm 720
87	PlasmaTherm 790
88	PlasmaTherm 790 RIE
89	ResMap 178
90	RIE/ICP Plasma etcher – Oxford Plasmalab 80+
91	RIE/ICP Plasma etcher – Oxford PlasmaPro100 Cobra
92	RTA – Rapid Thermal Anneal Sitesa addax RM6 Rapid Thermal Anneal
93	SAMCO RIE 10 NR
94	SAVANNAH S200-ALD
95	Scanning Electron Microscope – FEI Verios 460
96	Scanning Electron Microscope – FEI XL30 SEM
97	Sloan Dektak II
98	Spin coater – Suss Delta 80 Spin coater
99	Sputter PVD system – S-Flex
100	STS ICP Bosch Process
101	STS ICP HRM
102	STS ICP Multiplex
103	STS PECVD
104	Surface profiler – KLA-Tencor alpha-step 500
105	Technics 2000
106	Technics PE-IIA
107	Tegal 901e
108	Tegal 903e
109	TEM – FEI TecnaiG2 20 X-Twin
110	Temescal BJD-1800
111	Temescal BJD-1800
112	Temescal FC-1800
113	Temescal FC-1800
114	Tencor Mgage-200
115	Tencor Mgage-300
116	Tencor Sonogage 200
117	TES FC-1800
118	Thin film analyzer – Filmetrics F20 UVX
119	Tube vacuum furnace (Homebuilt)
120	UV lithography system – Suss MABA6 Mask aligner
121	Vacuum coating system – Handy Smurf (Homebuilt)
122	Vacuum coating system – Nanoontje (Homebuilt)
123	Vacuum oven – General purpose vacuum oven
124	Varian 3120 E-Beam
125	Wet benches – Organic, anorganic and general purpose wet bench