Description
OXFORD Plasmalab 800+ PECVD
This tool was removed from production October 2014.
Configuration:
Set up for SiOx, SiNx, SiOxNy Deposition
Batch Process
450mm Platen with 300°C+ heater
RF Power: 350W 13.56MHz and 300W 480KHz
Gas pod with 6 lines including following MFCs:
N2 – 1000sccm
N2O – 100sccm
N2O – 2000sccm
NH3 – 100sccm
SiH4 – 2000sccm
Windows PC , user friendly interface
Pump and chiller are not included but are available for purchase separately.
SS111671441360
