Description
Oxford Plasma Technology RIE-80 Plasma Etching System
System is In Good Physical Condition.
The Oxford MicroP Is A Small Research RIE Etching System And Has The Following Features:
Specifications
-
RIE Parallel Plate Electrodes
- Capacitance Manometer
-
Three Channels of Process Gas [Mass Flow Controllers]
-
600 Watt ENI RF Power
-
Process Timer
-
Vent Valve
SS131495407345