Oxford Plasma Technology RIE-80 Plasma Etching System

Description

Oxford Plasma Technology RIE-80 Plasma Etching System

System is In Good Physical Condition. 

The Oxford MicroP Is A Small Research RIE Etching System And Has The Following Features:

Specifications

  • RIE Parallel Plate Electrodes
  • Capacitance Manometer 
  • Three Channels of Process Gas [Mass Flow Controllers]
  • 600 Watt ENI RF Power 
  • Process Timer
  • Vent Valve

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