MRC 943 Sputtering System

MRC 943 Down Sputtering System/ MRC 943 Sputtering System

Fully automated controlled system.

Recipe storage.

Hi-Vac and heat load lock with CTI pump.

CTI cryo pumped main chamber.

10 kW DC supply.

MRC 1.5 kW RF power supply.

RF etch.

Three RF/DC Planer cathodes.