Description
- LPCVD
- Annealing
- Diffusion
- Oxidation
LPCVD Furnace System(Low pressure CVD/Furnace System) Options
- Chamber material : Quartz、Al2O3、Graphite
- Furnace type: Horizontal, Vertical
- Maximum Temperature : 1100℃、1300 ℃、1500 ℃、 1700 ℃
- OES or RGA systems.
- Load-Lock System(single substrate, cassette-to-cassette)
- Cluster able for vacuum transfer of substrates