Description

Model: LAM TCP9400 SE SOLD

Category: Plasma Etch

Original Equipment Manufacturer: Lam Research

Condition: In Warehouse, Bagged & Skidded

Process: STI ETCHER

Wafer Size: 8-inch

Valid Time: Subject to prior sale

Serial Number:40086

Software Version: 1.6.012A

CIM: SECS

Main System:LAM POLY ETCHER

SMIF System: ASSYST (2 Units)

Handler System: Platform(1 Unit); Indexer (2 Units)

Process Chamber: 1 Unit

Power Distribution box: 1 Unit

Inspection: Against appointment after PO and payment.

Equipment Configuration:

Item
Software version 1.6.012A
Process type: Etch STI
No of Process Chambers: 1
Wafer Diameter 200mm
Critical to Process
(1)Process Gas distribution.
MFC 1 (Gas type / size sccm) CL2/ 200
MFC 2 O2/ 100
MFC 3 HEO2/ 20
MFC 4 CF4/ 100
MFC 5 HBR/ 300
MFC 6 HF6/ 100
MFC 7 HE/500
MFC 8 N2/ 50
Manometer type/range (MKS) 629A-14608
(2)Hardware Parameters
Tcp RF gen type/model 1250 RFDS
Bot RF gen type/model 1250 HALO
Chamber Temp (Wall) Deg. Room T – +60 Deg
Chamber Temp (Upper electrode) Deg. Room T – +60 Deg
Chamber Temp (Lower electrode) Deg. 65 Deg
Chiller used BOC 40/80
TCP Coil position 5 O ‘ CLK
Vat Vale/Pendulum Valve VAT -64 Valve
PC Pump A30WN
Load Lock Pump A30W
Turbo Pump capacity 1300L
TCP RF AO Setting 1220
TCP AI Setting 1220
TCP REF PWR AI Setting 250
BIAS AO Setting 1250
BIAS AI Setting 1250
BIAS REF PWR AI Setting 250
WAC/NonWAC NonWAC