Description
Please contact us if you are interested in the Karl Suss MJB4 Mask Aligner. The Karl Suss MJB4 Mask Aligner is only for end users and are subject to prior sale without notice. Appreciate your time.
The MJB4 Mask Aligner allows different type of contact exposures (vacuum, hard, soft proximity contact) for different size sample (up to 4 inch in diameter). The achievable adjustment accuracy X, Y and theta is below 1 um. Masks and wafer/substrates to a total thickness of 9.00 mm can be processed. The MJB4 is equipped with 400 nm exposure optics and lamps that allow a sub-micro exposure in vacuum contact.
*Positive and negative tone photoresists
*Substrate sizes up to 4 inches in diameter
*4 inch or 5 inch mask plates
*Topside alignment only
*Minimum alignment mark separation for binocular vision: 3.5 cm
*Typical pattern resolution 1 micrometer
*Achievable alignment resolution 1 micrometer
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