Description
Axic Benchmark 800 ICP Plasma Enhanced Chemical Vapor Deposition System PECVD
- Tool used in research, process development or low volume production for precise etching and deposition on substrates up to 8-inches in diameter.
- The system can be operated in either a batch or single slice mode.
- Features single-piece chamber construction, proven process recipes, field proven components, computer control with Windows programming.
- Previous gases used N2, SF6, He, SiH4, NH3, N2O.
- Dual Advanced Energy Dressler Cesar RF generators
SS252995018945
