Description
The following used semiconductor equipment are in USA. They are only for end users. Valid Time: Subject to prior sale. ID-SS0992-0-1.Appreciate your time!
- KLA Tencor F5x consisting of:Dual Open Cassette Handler
- KLA Tencor P-10 Profiler consisting of:Max wafer size: 8″/200mm,Manual Wafer Load Profilometer
- KLA Tencor Prometrix UV-1050 Thin Film Measurement System consisting of:Dual beam spectrophotometry.Wafer sizes: 100mm, 150mm, and 200mm
- KLA-Tencor Surfscan 5500 Inspection System consisting of:Can handle from 2″ up to 8″/200mm wafers,Submicron sensitivity, detects 0.2 micron particles
- Plasmatherm / Unaxis SLR-730 PECVD Dual Chamber System consisting of:Dual Chamber System,Load locked,Plasmatherm 790 RIE System consisting of:Non Load Locked Single RIE Chamber,RFPP 500W RF Generator
- Suss MA150e Mask Aligner consisting of:Topside Alignment (TSA), AL3000 Automatic Alignment ,1000 Watt Lamphouse,Exposure Optics: UV400 Optics (365nm/405nm exposure),Power Supply: CIC1200,Suss DVM6 Microscope
- Suss MA6/BA6 Mask Aligner consisting of:Topside (TSA) and Backside (BSA) Alignment.Suss DVM6 Microscope. UV400 Optics (for 365nm and 405nm exposure).CIC 500 Power Supply.350 Watt Lamphouse
- Suss MicroTec / Karl Suss MA8/BA8 Mask Aligner Gen2 consisting of:Topside (TSA) and Backside (BSA) Alignment.
- Suss MJB3 350W Mask Aligner consisting of:Top Side Alignment (TSA),CIC500 Power Supply,350W Lamphouse,UV400 Exposure Optics (for 365nm and 405nm)
- Veeco Dimensions 3100 AFM consisting of:Stage with Enhanced Motorized Positioning and 125x100mm inspectable area,Nanoscope 3D Controller,Quadrex extender
- YES-58 HMDS Vapor Prime Oven consisting of:Dual Function (Prime / Reversal),Up to 200 Degrees Celsius,HMDS Cylinder
- YES-58TA HMDS Oven consisting of:HMDS level sensor (PLC notifies operator via touchscreen),Kashiyama Vacuum Pump,Primes 8 cassettes of 125mm or 150mm wafers or 12 cassettes of 100mm wafers.