Description
CVC Connexion Cluster Tool Sputtering Deposition System . An important feature of the CVC Cluster Tool over conventional stand-alone vacuum processing equipment is the possibility to dock and undock modules at any given time. Multistep sequential vacuum processes may be integrated in a single cluster tool. Such vacuum integrated processing results in a cleaner process as both microcontamination (i.e. particles) and chemical contamination (due to exposure to air) between different steps are avoided. It may also lead to improved throughput and cycle time by having a single load-lock pumpdown for all processes. The CVC Connexion Cluster Tool provides an excellent platform for process development and rapid transfer into production. The modular design also enables simple upgrades and extendibility as the process and throughput requirements change over time. Multi Target DC Sputtering Cluster Tool With RF Etch and Loadlock.
• (4) 12” DC magnetron cathodes with rotating magnet assemblies for even target consumption.
Valid time: Subject to prior sale without notice.
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ID-SS1184













