Description
Please contact us if you are interested in the following Equipment and Parts. The Equipment and Parts are only for end users and are subject to prior sale without notice. Appreciate your time.
PATTERN MAKING | |
Spin Coater | Brewer Cee 200 Spin Coater |
Mask Aligner | ABM Mask Aligner |
SEM (eBeam) | FEI XL-30FEG SEM equipped with NPGS (nanopattern generation system) |
eBeam Writer | JEOL JBX 5500FS eBeam writer |
Nanoimprinter | Nanonex NX-2004 Nanoimprinter |
MATERIAL DEPOSITION | |
UHV Sputtering System | AJA UHV six-source sputtering system |
eBeam Evaporator | Thermionics eBeam Evaporator |
Desktop Sputtering System | Denton Desk II |
ETCHING | |
Reactive Ion Etcher (RIE 80) | Oxford Plasma Lab 80 Plus RIE (Ar, O2, CF4, CHF3, SF6) |
Reactive Ion Etcher (RIE 100) | Oxford Plasma Lab 100 RIE (Ar, O2) |
Deep Reactive Ion Etcher (RIE 180) | Oxford Plasma Lab ICP 180 RIE (Ar, O2, CHF3, SF6, C4F8) |
Ion Mill | Custom High-Rate Ion Mill |
ANALYSIS | |
Atomic Force Microscope | Veeco Dimensions 3000 Atomic Force Microscope |
Profilometer | Alpha-Step 200 Profilometer |
Optical Microscopes | Leitz Microscope, Olympus Inspection Microscope |
PROCESSING | |
RTP | AccuThermo AW 410 RTP/RTA |
Ovens | Blue M Electric Ovens |
DIRECT MACHINING | |
Focused Ion Beam (FIB) | FEI 235 Dual-Beam Focused Ion-beam System equipped with TEM sample extraction probe |
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