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Equipment and Parts

Equipment and Parts

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Description

Please contact us if you are interested in the following  Equipment and Parts. The  Equipment and Parts are only for end users and are subject to prior sale without notice. Appreciate your time.

PATTERN MAKING
Spin Coater Brewer Cee 200 Spin Coater
Mask Aligner ABM Mask Aligner
SEM (eBeam) FEI XL-30FEG SEM equipped with NPGS (nanopattern generation system)
eBeam Writer JEOL JBX 5500FS eBeam writer
Nanoimprinter Nanonex NX-2004 Nanoimprinter
MATERIAL DEPOSITION
UHV Sputtering System AJA UHV six-source sputtering system
eBeam Evaporator Thermionics eBeam Evaporator
Desktop Sputtering System Denton Desk II
ETCHING
Reactive Ion Etcher (RIE 80) Oxford Plasma Lab 80 Plus RIE (Ar, O2, CF4, CHF3, SF6)
Reactive Ion Etcher (RIE 100) Oxford Plasma Lab 100 RIE (Ar, O2)
Deep Reactive Ion Etcher (RIE 180) Oxford Plasma Lab ICP 180 RIE (Ar, O2, CHF3, SF6, C4F8)
Ion Mill Custom High-Rate Ion Mill
ANALYSIS
Atomic Force Microscope Veeco Dimensions 3000 Atomic Force Microscope
Profilometer Alpha-Step 200 Profilometer
Optical Microscopes Leitz Microscope, Olympus Inspection Microscope
PROCESSING
RTP AccuThermo AW 410 RTP/RTA
Ovens Blue M Electric Ovens
DIRECT MACHINING
Focused Ion Beam (FIB) FEI 235 Dual-Beam Focused Ion-beam System equipped with TEM sample extraction probe

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The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers