Description
Please contact us if you are interested in the following Cleaning Equipment . The Cleaning Equipment are only for end users and are subject to prior sale without notice. Appreciate your time.
Equip Code | Name | Type |
52 | Abrasive Blast Cabinet | Other |
99 | Air Control Wet Bench | Wet Bench |
140 | Anatech Resist Strip | Plasma/Stripper |
142 | Anatech SCE 110 (DE-02) | Other |
161 | ASH1 | Plasma/Stripper |
162 | Asher | Plasma/Stripper |
191 | Aura 1000 Resist Strip | Plasma/Stripper |
195 | Automatic Bottle Washer | Wet Bench |
209 | Barrel Asher | Plasma/Stripper |
210 | BarrelEtch | Plasma/Stripper |
218 | BATH1 | Wet Bench |
219 | BATH2 | Wet Bench |
316 | Chemical Hoods/Wet Benches | Wet Bench |
319 | Clean-1 and 2 Wetbench | Wet Bench |
321 | CMOS Cleaning Station (Marcus) | Wet Bench |
322 | CMOS Cleaning Station (Pettit) | Wet Bench |
323 | CMOS Spin Rinse Dryer (Inorganic) | Spin Rinse Drying |
324 | CMOS Spin Rinse Dryer (SRD) – Pettit | Spin Rinse Drying |
356 | CPD1 | Critical Point Drying |
357 | CPD3 | Critical Point Drying |
361 | Crest Ultrasonic Cleaner | Other |
363 | Critical Point Drier | Critical Point Drying |
365 | Critical Point Dryer | Critical Point Drying |
366 | Critical Point Dryer | Critical Point Drying |
367 | Critical Point Dryer | Critical Point Drying |
369 | Critical Point Dryer | Critical Point Drying |
370 | Critical Point Dryer | Critical Point Drying |
371 | Critical Point Dryer – Leica | Critical Point Drying |
372 | Critical Point Dryer – Tousismis | Critical Point Drying |
403 | Decon and Clean-3 Wetbench | Wet Bench |
671 | Fumehood 1 Left | Wet Bench |
672 | Fumehood 1 Right | Wet Bench |
673 | Fumehood 2 Left | Wet Bench |
674 | Fumehood 2 Right | Wet Bench |
675 | Fumehood 3 Left | Wet Bench |
676 | Fumehood 3 Right | Wet Bench |
701 | General Chemistry Hoods | Wet Bench |
706 | Germanium wbgen-2 | Wet Bench |
707 | Glen 1000 Resist Strip | Plasma/Stripper |
713 | GLOW1 | Other |
722 | Hamatech Hot Piranha | Other |
723 | Hamatech Hot SC1/SC2 | Wet Bench |
726 | Hamatech Post CMP Brushcleaner | Other |
861 | IoN Wave 10 Plasma Asher | Plasma/Stripper |
959 | Lam OnTrak DSS200 Series II Brush Cleaner | Other |
964 | Large Sonicator | Other |
1002 | LFE Barrel Etcher-Soft Lithography | Plasma/Stripper |
1012 | Lithography Solvent Bench | Wet Bench |
1082 | MEMS Spin Rinse Dryer (SRD) | Spin Rinse Drying |
1083 | MEMS Wet Bench | Wet Bench |
1143 | Miscellaneous Photoresist Wetbench | Wet Bench |
1155 | MOS Clean Bench & Tanks | Wet Bench |
1211 | Nanostrip Tank | Wet Bench |
1231 | Nitride and Tweezer Cleaning Wetbench | Wet Bench |
1232 | Non-Metal Wetbench | Wet Bench |
1321 | PE-200 | Plasma/Stripper |
1322 | PE-200 | Plasma/Stripper |
1323 | PE-50 | Plasma/Stripper |
1324 | PE100 | Plasma/Stripper |
1373 | Plasma Asher | Plasma/Stripper |
1378 | Plasma Cleaner | Plasma/Stripper |
1380 | Plasma Cleaner | Plasma/Stripper |
1384 | Plasma Etch PE-100 Plasma ystem | Plasma/Stripper |
1397 | Plasma-Etcher Plasma Cleaner | Plasma/Stripper |
1459 | PVA Tepla Ion 10 | Plasma/Stripper |
1512 | RCA Clean Wet Process Station | Wet Bench |
1513 | RCA Cleaning Wet Bench | Wet Bench |
1570 | Samco UV Ozone Dry Stripper | Stripper |
1575 | Santa Clara Stainless Steel Wet Bench | Wet Bench |
1638 | Semitool Spin Rinse Dryer — Instructional Center | Spin Rinse Drying |
1674 | Solvent Fumehood Left | Wet Bench |
1675 | Solvent Fumehood Right | Wet Bench |
1676 | Solvent Process Bench | Wet Bench |
1677 | Solvent Processing Station | Resist Processing |
1680 | Solvents Wet Bench | Wet Bench |
1681 | Solvents Wet Bench (Photolithography Bay) | Wet Bench |
1702 | Spin Rinse Dryer | Spin Rinse Drying |
1703 | Spin Rinse Dryer (Photolithography Bay) | Spin Rinse Drying |
1704 | Spin Rinse Dryer (Wet Etch Bay) | Spin Rinse Drying |
1705 | Spin Rinse Dryers (SRD) | Spin Rinse Drying |
1706 | Spin Rinser & Drier SAT | Spin Rinse Drying |
1707 | Spin Rinser & Drier- 8" | Spin Rinse Drying |
1742 | SRD 1-4 | Spin Rinse Drying |
1743 | SRD SPIN RINSER & DRIER | Spin Rinse Drying |
1803 | SWC 3000-C Mask Cleaner | Other |
1814 | Technics RIE (DE-01) | Plasma/Stripper |
1843 | Tepla 100 | Plasma/Stripper |
1845 | TFT Clean Bench & Tanks | Wet Bench |
1896 | Tousimis 916B Critical Point Dryer | Critical Point Drying |
1897 | Tousimis AutoSamdri 815A | Critical Point Drying |
1898 | Tousimis Autosamdri 815B | Critical Point Drying |
1899 | Tousimis Critical Point Dryer | Critical Point Drying |
1900 | Tousimis Critical Point Dryer | Critical Point Drying |
1901 | Tousimis Super Critical Dryer (Marcus) | Critical Point Drying |
1902 | Tousimis Super Critical Dryer (Pettit) | Critical Point Drying |
1948 | Ultrasonic and Megasonic Cleaners | Other |
1951 | Ultratech Plate Cleaner | Other |
1969 | UV Ozone Cleaner | Plasma/Stripper |
1995 | Verteq Spin Rinse Dryer — Instructional Center | Spin Rinse Drying |
1996 | Verteq Spin Rinse Dryer — Instructional Center | Spin Rinse Drying |
1997 | Verteq Superclean Spin Rinse Dryer | Wet Bench |
2011 | WAFAB Bottle Washer Bench | Wet Bench |
2012 | WAFAB Cleaning Bench | Wet Bench |
2015 | WAFAB Solvent Bench | Wet Bench |
2033 | Wet Bench – Etching | Wet Bench |
2034 | Wet Bench – General Use | Wet Bench |
2035 | Wet Bench – General Use | Wet Bench |
2036 | Wet Bench – HF | Wet Bench |
2037 | Wet Bench – KOH | Wet Bench |
2038 | Wet Bench – RCA | Wet Bench |
2040 | Wet Bench – Solvents | Wet Bench |
2041 | Wet Chemistry for Wafer Cleaning | Wet Bench |
2062 | WPS- acid C11 C14 C16 G12-14 H14-15 | Wet Bench |
2063 | WPS- solvent F06 G8-11 | Wet Bench |
2099 | YES Asher | Plasma/Stripper |
2100 | YES Asher | Plasma/Stripper |
2101 | YES CV200 RFS Plasma Strip / Descum System | Plasma/Stripper |
2111 | YES-R1 Plasma Cleaner | Plasma/Stripper |
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All used equipment /parts trademarks belongs to the original equipment manufacturer. All rights reserved.